COG dielectric composition for use with nickel electrodes

US9852848B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9852848-B2
Application numberUS-201615317545-A
CountryUS
Kind codeB2
Filing dateJun 27, 2016
Priority dateJul 23, 2015
Publication dateDec 26, 2017
Grant dateDec 26, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Multilayer ceramic chip capacitors which satisfy COG requirements and which are compatible with reducing atmosphere sintering conditions so that non-noble metals such as nickel and nickel alloys thereof may be used for internal and external electrodes are made in accordance with the invention. The capacitors exhibit desirable dielectric properties (high capacitance, low dissipation factor, high insulation resistance), excellent performance on highly accelerated life testing, and very good resistance to dielectric breakdown. The dielectric layers comprise a barium strontium zirconate matrix doped with other metal oxides such as TiO 2 , CaO, B 2 O 3 , and MgO in various combinations.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition comprising a mixture of precursors that, upon firing, forms a dielectric material comprising: from about 26.5 wt % to about 34.0 wt % BaO; from about 18.0 wt % to about 24.5 wt % SrO; from about 41.0 wt % to about 50.0 wt % ZrO 2 ; from about 0.50 wt % to about 1.50 wt % CaO; and from about 0.70 wt % to about 2.50 wt % TiO 2 . 2. The composition according to claim 1 , further comprising precursors such that upon firing the dielectric material further comprises: from about 0.01 to about 1.0 wt % B 2 O 3 ; and from about 0.01 to about 1.47 wt % MgO. 3. A lead-free and cadmium-free dielectric paste comprising a solids portion wherein the solids portion comprises the dielectric material of claim 1 . 4. The lead-free and cadmium-free dielectric paste of claim 3 , wherein the solids portion further comprises at least one selected from the group consisting of: from about 0.01 to about 1.0 wt % B 2 O 3 ; from about 0.01 to about 1.47 wt % MgO; from about 0.01 to about 1.78 wt % H 3 BO 3 ; and from about 0.01 to about 2.14 wt % Mg(OH) 2 . 5. A method of forming an electronic component comprising: applying the dielectric paste of claim 4 to a substrate; and firing the substrate at a temperature sufficient to sinter the dielectric paste. 6. The method of claim 5 , wherein the firing is conducted at a temperature of from about 1200° C. to about 1350° C. 7. A multilayer ceramic chip capacitor comprising a fired collection of alternately stacked: layers of the dielectric paste of claim 4 ; and layers of an internal electrode material comprising a transition metal other than Ag, Au, Pd, or Pt. 8. The multilayer ceramic chip capacitor of claim 7 , wherein the internal electrode material comprises nickel. 9. A method of forming an electronic component comprising: alternately applying layers of the dielectric paste of claim 4 , to form at least one dielectric layer and a metal-containing electrode paste, to form at least one internal electrode layer onto a substrate to form a laminar stack; cutting the laminar stack to a predetermined shape; separating the cut stack from the substrate; and firing the stack to densify the metal in the electrode paste and sinter the dielectric paste, wherein the internal electrode layer and the dielectric layer each have a layer thickness. 10. The method of claim 9 , wherein the firing is conducted at a temperature of from about 1200° C. to about 1350° C. 11. The method of claim 9 , wherein the firing is conducted in an atmosphere having a partial oxygen pressure of about 10 −12 atm to about 10 −8 atm. 12. A lead-free and cadmium-free dielectric composition comprising: from about 47.8 wt % to about 61.3 wt % BaZrO 3 ; from about 39.4 wt % to about 53.6 wt % SrZrO 3 ; from about 1.2 wt % to about 3.6 wt % CaTiO 3 ; from about 0.1 wt % to about 2.14 wt % Mg(OH) 2 ; and from about 0.1 wt % to about 1.78 wt % H 3 BO 3 . 13. A lead-free and cadmium-free dielectric paste comprising a solids portion wherein the solids portion comprises: from about 47.8 wt % to about 61.3 wt % BaZrO 3 ; from about 39.4 wt % to about 53.6 wt % SrZrO 3 ; from about 1.2 wt % to about 3.6 wt % CaTiO 3 ; from about 0.1 wt % to about 2.14 wt % Mg(OH) 2 ; and from about 0.1 wt % to about 1.78 wt % H 3 BO 3 . 14. A method of forming an electronic component comprising: applying the dielectric paste of claim 13 to a substrate; and firing the substrate at a temperature sufficient to sinter the dielectric paste. 15. The method of claim 14 , wherein the firing is conducted at a temperature of from about 1200° C. to about 1350° C. 16. The method of claim 14 , wherein the firing is conducted in an atmosphere having a partial oxygen pressure of about 10 −12 atm to about 10 −8 atm. 17. A multilayer ceramic chip capacitor comprising a fired collection of: alternately stacked: layers of the dielectric paste of claim 13 ; and layers of an internal electrode material comprising a transition metal other than Ag, Au, Pd, or Pt. 18. The multilayer ceramic chip capacitor of claim 17 , wherein the internal electrode material comprises nickel. 19. A method of forming an electronic component comprising: alternately applying layers of a dielectric material comprising the paste of claim 13 to form at least one dielectric layer and a metal-containing electrode paste to form at least one internal electrode layer onto a substrate to form a laminar stack; cutting the laminar stack to a predetermined shape; separating the cut stack from the substrate; and firing the stack to densify the metal in the electrode paste and sinter the dielectric paste, wherein the at least one internal electrode layer and the at least one dielectric layer each have a layer thickness. 20. The method of claim 19 , wherein the firing is conducted at a temperature of from about 1200° C. to about 1350° C. 21. The method of claim 19 , wherein the firing is conducted in an atmosphere having a partial oxygen pressure of about 10 −12 atm to about 10 −8 atm.

Assignees

Inventors

Classifications

  • H01G4/1245Primary

    containing also titanates · CPC title

  • Titanium oxides or titanates, e.g. rutile or anatase · CPC title

  • Carbonates · CPC title

  • Water vapor containing atmospheres · CPC title

  • containing also titanium oxides or titanates · CPC title

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What does patent US9852848B2 cover?
Multilayer ceramic chip capacitors which satisfy COG requirements and which are compatible with reducing atmosphere sintering conditions so that non-noble metals such as nickel and nickel alloys thereof may be used for internal and external electrodes are made in accordance with the invention. The capacitors exhibit desirable dielectric properties (high capacitance, low dissipation factor, high…
Who is the assignee on this patent?
Ferro Corportion, Ferro Corp
What technology area does this patent fall under?
Primary CPC classification H01G4/1245. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 26 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).