LiCoO2 Sputtering Target, Production Method Therefor, And Positive Electrode Material Thin Film

Patent metadata

Field	Value
Publication number	US-2017148614-A1
Application number	US-201515127461-A
Country	US
Kind code	A1
Filing date	Mar 10, 2015
Priority date	Mar 26, 2014
Publication date	May 25, 2017
Grant date	—

Abstract

A sputtering target having a composition of LiCoO 2 , wherein a resistivity of the target is 100 Ωcm or less, and a relative density is 80% or higher. The sputtering target of the present invention is effective for use in forming a positive electrode thin film in all-solid-state thin-film lithium ion secondary batteries equipped in vehicles, information and communication electronics, household appliances, and the like.

First claim

1 : A LiCoO 2 sputtering target having a composition of LiCoO 2 , wherein an average resistivity of a target surface is 100 Ωcm or less, a relative density is 80% or higher, and an average resistivity of a position corresponding to half the thickness of the target is not greater than double the average resistivity of the target surface.

2 : The LiCoO 2 sputtering target according to claim 1 , wherein the relative density is 85% or higher.

3 : The LiCoO 2 sputtering target according to claim 2 , wherein the average resistivity of the target surface is 50 Ωcm or less.

4 : The LiCoO 2 sputtering target according to claim 3 , wherein an in-plane maximum resistivity of the target is not greater than double the average resistivity of the target surface.

5 - 6 . (canceled)

7 : A method of producing the LiCoO 2 sputtering target according to claim 1 , comprising hot pressing a lithium cobalt oxide powder at 600 to 950° C., and thereafter performing heat treatment at 950 to 1150° C. in an atmosphere or in an oxygen atmosphere to produce a target.

8 : A method of producing the LiCoO 2 sputtering target according to claim 1 , comprising subjecting a lithium cobalt oxide powder to cold isostatic press for molding, and thereafter repeatedly performing heat treatment to the resultant molded article in an atmosphere or in an oxygen atmosphere two or more times to produce a target, wherein temperature of final heat treatment is set to be 950 to 1150° C., temperature of any preceding heat treatment is set to be a temperature that is not higher than the temperature of the final heat treatment, and a process of cooling to a room temperature is provided between the respective heat treatment processes.

9 : A method of producing the LiCoO 2 sputtering target according to claim 1 , comprising subjecting a lithium cobalt oxide powder to cold isostatic press to be molded into a cylindrical shape, and thereafter repeatedly performing heat treatment to the resultant molded article in an atmosphere or in an oxygen atmosphere two or more times to produce a cylindrical target, wherein temperature of final heat treatment is set to be 950 to 1150° C., temperature of any preceding heat treatment is set to be a temperature that is not higher than the temperature of the final heat treatment, and a process of cooling to a room temperature is provided between the respective heat treatment processes.

10 : The method of producing a LiCoO 2 sputtering target according to claim 7 , wherein, in the heat treatment process, heat treatment is repeated two or more times, temperature of final heat treatment is set to be 950 to 1150° C., and temperature of any preceding heat treatment is set to be a temperature that is not higher than the temperature of the final heat treatment.

11 : The LiCoO 2 sputtering target according to claim 1 , wherein the average resistivity of the target surface is 50 Ωcm or less.

12 : The LiCoO 2 sputtering target according to claim 1 , wherein an in-plane maximum resistivity of the target is not greater than double the average resistivity of the target surface.

Assignees

• Jx Nippon Mining & Metals Corp

Inventors

• Satoh Kazuyuki

Classifications

• B28B3/003

  Pressing by means acting upon the material via flexible mould wall parts, e.g. by means of inflatable cores, isostatic presses (isostatic presses in general B30B5/02) · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• H01J37/3426 Primary

  Material · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• Y02E60/10

  Energy storage using batteries · CPC title