Vessel rinsing device
US-2026027602-A1 · Jan 29, 2026 · US
the liquid being ozonated
the liquid being ozonated · Cooperative Patent Classification (CPC)
Separating, mixing, shaping, printing, and transporting materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | B08B2203/005 |
| Official title | the liquid being ozonated |
| Display label | the liquid being ozonated |
| Total patents | 53 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 2 |
| 2017 | 2 |
| 2018 | 2 |
| 2019 | 3 |
| 2020 | 6 |
| 2021 | 5 |
| 2022 | 6 |
| 2023 | 12 |
| 2024 | 6 |
| 2025 | 7 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Substrate processing apparatus and substrate processing method
US-2025246453-A1 · Jul 31, 2025 · US
Method for cleaning substrate
US-12358030-B2 · Jul 15, 2025 · US
Ultraviolet and ozone cleaning apparatus and method of using
US-2025161999-A1 · May 22, 2025 · US
Deposition mask cleaning apparatus and deposition mask cleaning method
US-12246362-B2 · Mar 11, 2025 · US
Ultraviolet and ozone cleaning apparatus and method of using
US-12233441-B2 · Feb 25, 2025 · US
Ozone water supplying unit and substrate treating apparatus including the same
US-2025041911-A1 · Feb 6, 2025 · US
Cleaning device, cleaning system including same, and cleaning method using said cleaning device
US-12195957-B2 · Jan 14, 2025 · US
Ultraviolet and ozone clean system
US-12159782-B2 · Dec 3, 2024 · US
Ultraviolet and ozone cleaning apparatus and method of using
US-2024157411-A1 · May 16, 2024 · US
Process fluid treatment apparatus, and wafer cleaning apparatus and semiconductor manufacturing equipment including same
US-2024145265-A1 · May 2, 2024 · US
Apparatus for treating substrate and method for treating a substrate
US-2024100572-A1 · Mar 28, 2024 · US
Method for cleaning silicon wafer
US-11878329-B2 · Jan 23, 2024 · US
Ultraviolet and ozone clean system
US-2024014028-A1 · Jan 11, 2024 · US
Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid
US-11817309-B2 · Nov 14, 2023 · US
Ultraviolet and ozone clean system
US-11798799-B2 · Oct 24, 2023 · US
Substrate processing method and substrate processing apparatus
US-11769661-B2 · Sep 26, 2023 · US
Substrate processing method and substrate processing device
US-11764055-B2 · Sep 19, 2023 · US
Method for cleaning substrate
US-2023278077-A1 · Sep 7, 2023 · US
Method of cleaning work and cleaning system for work
US-2023271229-A1 · Aug 31, 2023 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC B08B2203/005?
- CPC B08B2203/005 is the Cooperative Patent Classification code for “the liquid being ozonated.”
- How many patents are filed under CPC B08B2203/005 (the liquid being ozonated)?
- Our database includes 53 publications tagged with this CPC code.
- Is patent activity under CPC B08B2203/005 growing?
- Publication counts under this code: 6 in 2024 vs 7 in 2025 (latest complete years).