Substrate processing apparatus and substrate processing method

Patent metadata

Field	Value
Publication number	US-2025246453-A1
Application number	US-202519029772-A
Country	US
Kind code	A1
Filing date	Jan 17, 2025
Priority date	Jan 25, 2024
Publication date	Jul 31, 2025
Grant date	—

Abstract

A substrate processing apparatus includes a chamber to accommodate a substrate having a front surface on which a device is provided and a rear surface positioned on an opposite side to the front surface, a substrate holder to hold the substrate in the chamber, a chemical liquid supply to supply a chemical liquid to the front surface of the substrate held by the substrate holder, a rinse liquid supply to supply a rinse liquid to the front surface of the substrate held by the substrate holder, a recovered-liquid storage tank to store a recovered liquid obtained by recovering a liquid, and a rear surface processing liquid supply to supply the recovered liquid stored in the recovered-liquid storage tank to the rear surface of the substrate.

First claim

What is claimed is:

1 . A substrate processing apparatus comprising:
a chamber to accommodate a substrate having a front surface on which a device is provided and a rear surface positioned on an opposite side to the front surface; a substrate holder to hold the substrate in the chamber; a chemical liquid supply to supply a chemical liquid to the front surface of the substrate held by the substrate holder; a rinse liquid supply to supply a rinse liquid to the front surface of the substrate held by the substrate holder; a recovered-liquid storage tank to store a recovered liquid obtained by recovering a liquid; and a rear surface processing liquid supply to supply the recovered liquid stored in the recovered-liquid storage tank to the rear surface of the substrate.

2 . The substrate processing apparatus according to claim 1 , further comprising a controller configured or programmed to determine whether or not to recover the liquid into the recovered-liquid storage tank.

3 . The substrate processing apparatus according to claim 2 , further comprising:
a storage tank to store a liquid; a heater to heat the liquid flowing from the storage tank; and a temperature sensor to measure a temperature of the liquid having heated by the heater, wherein the controller is configured or programmed to determine whether or not to recover a liquid heated by the heater into the recovered-liquid storage tank based on the temperature measured by the temperature sensor.

4 . The substrate processing apparatus according to claim 2 , further comprising:
an ozone gas generator to generate an ozone gas; an ozone gas dissolving tank to dissolve the ozone gas generated in the ozone gas generator into a liquid to generate an ozone liquid; and a concentration sensor to measure an ozone concentration of the ozone liquid generated in the ozone gas dissolving tank, wherein the controller is configured or programmed to determine whether or not to recover the ozone liquid generated in the ozone gas dissolving tank into the recovered-liquid storage tank based on the ozone concentration measured by the concentration sensor.

5 . The substrate processing apparatus according to claim 1 , wherein
the chemical liquid supply includes a chemical liquid storage tank to store the chemical liquid, and the recovered-liquid storage tank is to store, as the recovered liquid, at least a part of a cleaning liquid which has cleaned the chemical liquid storage tank.

6 . The substrate processing apparatus according to any claim 1 , further comprising:
a cup to trap a processing liquid scattering from a substrate held by the substrate holder; a drain piping that connects the cup and the recovered-liquid storage tank; and a chamber cleaning piping which is disposed in the chamber and through which a cleaning liquid for cleaning an inside of the chamber is to be discharged, wherein the recovered-liquid storage tank is to store, as the recovered liquid, at least a part of a cleaning liquid discharged from the chamber cleaning piping.

7 . The substrate processing apparatus according to any claim 1 , wherein
the rinse liquid supply includes a rinse liquid piping in which the rinse liquid is to flow, and a valve that is provided in the rinse liquid piping and is to adjust a flow rate of the rinse liquid flowing in the rinse liquid piping, the substrate processing apparatus further comprising a branch piping which is connected to the rinse liquid piping at a more upstream position than the valve) on the rinse liquid piping and in which the rinse liquid is to flow even in a case where the valve is closed, and the recovered-liquid storage tank is to store, as the recovered liquid, the rinse liquid which has flowed through the branch piping.

8 . A substrate processing method comprising:
supplying a chemical liquid to a front surface of a substrate having the front surface on which a device is provided and a rear surface positioned on an opposite side to the front surface; supplying a rinse liquid to the front surface of the substrate after the chemical liquid is supplied to the front surface of the substrate; and supplying a recovered liquid to the rear surface of the substrate from a recovered-liquid storage tank that is to store the recovered liquid obtained by recovering a liquid.

9 . The substrate processing method according to claim 8 , further comprising determining whether or not to recover the liquid into the recovered-liquid storage tank.

10 . The substrate processing method according to claim 9 , further comprising:
heating a liquid flowing from a storage tank to store the liquid; and measuring a temperature of the heated liquid, wherein, in the determination, whether or not to recover the heated liquid into the recovered-liquid storage tank is determined based on the measured temperature.

11 . The substrate processing method according to claim 9 , further comprising:
dissolving an ozone gas in a liquid to generate an ozone liquid; and measuring an ozone concentration of the generated ozone liquid, wherein, in the determination, whether or not to recover the generated ozone liquid into the recovered-liquid storage tank is determined based on the measured ozone concentration.

12 . The substrate processing method according claim 8 , further comprising supplying, as the recovered liquid, at least a part of a cleaning liquid which has cleaned a chemical liquid storage tank to store the chemical liquid to the recovered-liquid storage tank.

13 . The substrate processing method according to claim 8 , further comprising:
discharging a cleaning liquid into a chamber, in which the substrate is to be processed, to clean the chamber; and supplying, as the recovered liquid, at least a part of the cleaning liquid discharged into the chamber to the recovered-liquid storage tank.

14 . The substrate processing method according to claim 8 , further comprising closing a valve provided in a rinse liquid piping in which the rinse liquid is to flow, causing a rinse liquid to flow to a branch piping connected to the rinse liquid piping at a more upstream position than the valve on the rinse liquid piping, and supplying, as the recovered liquid, the rinse liquid which has flowed through the branch piping to the recovered-liquid storage tank.

Assignees

• Screen Holdings Co Ltd

Inventors

• KAMMURI Takuya
• Nagami Shuzo
• Okamoto Koichi
• Sawashima Jun

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0416

  with the semiconductor substrates being dipped in baths or vessels · CPC title