Locally heated multi-zone substrate support

US9984912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9984912-B2
Application numberUS-201715676031-A
CountryUS
Kind codeB2
Filing dateAug 14, 2017
Priority dateAug 6, 2013
Publication dateMay 29, 2018
Grant dateMay 29, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the present disclosure provide an electrostatic chuck (ESC) having azimuthal temperature control. In one embodiment, the electrostatic chuck includes an insulating base, an encapsulating member disposed on the insulating base, a first plurality of electrodes and a second plurality of electrodes disposed at a first elevation in the encapsulating member, the first plurality of electrodes intervening with the second plurality of electrodes, and a plurality of heating elements disposed at a second elevation in the encapsulating member, the heating elements being arranged in the form of discrete sections.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrostatic chuck, comprising: an insulating base; an encapsulating member disposed on the insulating base; a first plurality of electrodes and a second plurality of electrodes disposed at a first elevation within the encapsulating member, the first plurality of electrodes and the second plurality of electrodes are alternatingly arranged across a surface of the insulating base; and a plurality of heating elements disposed at a second elevation in the encapsulating member, the heating elements being arranged in the form of discrete sections. 2. The electrostatic chuck of claim 1 , wherein each of the first and second plurality of electrodes has electrode islands connecting to each other through an interconnection. 3. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes and the second plurality of electrodes are coplanar. 4. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes is disposed at a first plane and the second plurality of electrodes is disposed at a second plane parallel to the first plane. 5. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes and the second plurality of electrodes are disposed in a pixel-like configuration. 6. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes and the second plurality of electrodes are alternatingly arranged in a polar array about a central axis. 7. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes and the second plurality of electrodes are arranged in a substantially concentric pattern. 8. The electrostatic chuck of claim 1 , wherein the first elevation and the second elevation are different. 9. The electrostatic chuck of claim 1 , wherein the first elevation and the second elevation are the same. 10. The electrostatic chuck of claim 1 , wherein the plurality of heating elements are resistive heating elements. 11. The electrostatic chuck of claim 1 , wherein the plurality of heating elements are inductive heating elements. 12. The electrostatic chuck of claim 1 , wherein the plurality of heating elements are disposed along a space between the first plurality of electrodes and the second plurality of electrodes. 13. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes generates charges with a polarity that is different from the second plurality of electrodes. 14. The electrostatic chuck of claim 1 , wherein the insulating base is formed from a ceramic material, a doped ceramic material, a dielectric material, a glass material, or a composite of ceramic and metal material. 15. The electrostatic chuck of claim 1 , wherein the insulating base is formed from a metallic or semiconducting body. 16. The electrostatic chuck of claim 15 , further comprising: a dielectric layer disposed on the insulating base. 17. The electrostatic chuck of claim 1 , wherein the encapsulating member is formed from a ceramic material, a glass material, or a composite of ceramic and metal material. 18. The electrostatic chuck of claim 1 , wherein the first plurality of electrodes and the second plurality of electrodes are each coupled to a DC power, an AC power, or a RF power. 19. The electrostatic chuck of claim 1 , wherein one or more of the plurality of heating elements are coupled to a temperature controller to provide a plurality of independently controllable heating zones across a surface of the electrostatic chuck. 20. The electrostatic chuck of claim 1 , further comprising: one or more grooves disposed near a top surface of the encapsulating member for circulating coolant.

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What does patent US9984912B2 cover?
Embodiments of the present disclosure provide an electrostatic chuck (ESC) having azimuthal temperature control. In one embodiment, the electrostatic chuck includes an insulating base, an encapsulating member disposed on the insulating base, a first plurality of electrodes and a second plurality of electrodes disposed at a first elevation in the encapsulating member, the first plurality of elec…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0432. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 29 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).