Electrostatic chuck

US9287806B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9287806-B2
Application numberUS-201313781502-A
CountryUS
Kind codeB2
Filing dateFeb 28, 2013
Priority dateOct 16, 2012
Publication dateMar 15, 2016
Grant dateMar 15, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is an electrostatic chuck capable of minimizing short circuits of electrodes due to scratches generated on a surface of the electrostatic chuck, and achieving stable absorption.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrostatic chuck comprising: an absorption plate configured to absorb and support a target object; and a rectangular absorption electrode formed in the absorption plate configured to generate an electrostatic force between the target object and the absorption electrode, wherein the absorption electrode comprises: a first electrode pattern; and a second electrode pattern formed around the first electrode pattern, having an electrode width greater than the electrode width of the first electrode pattern, and having an area less than or equal to the area of the first electrode pattern; wherein the electrode width of the first electrode pattern is about 0.5 to about 1 mm. 2. The electrostatic chuck of claim 1 , wherein the electrode width of the second electrode pattern is about 30 to about 50 mm. 3. The electrostatic chuck of claim 1 , wherein an electrode gap of the first electrode pattern is about 0.5 to about 1 mm. 4. The electrostatic chuck of claim 2 , wherein an area of the second electrode pattern is about 15 to about 25% of a whole area of the absorption electrode. 5. The electrostatic chuck of claim 1 , wherein the first electrode pattern comprises alternately aligned positive electrodes and negative electrodes. 6. The electrostatic chuck of claim 5 , wherein the first electrode pattern comprises: a plurality of positive base electrodes connected to the positive electrodes; and a plurality of negative base electrodes connected to the negative electrodes. 7. The electrostatic chuck of claim 1 , wherein the second electrode pattern comprises alternately aligned electrodes and negative electrodes. 8. The electrostatic chuck of claim 7 , wherein the second electrode pattern comprises: a plurality of positive base electrodes connected to the positive electrodes; and a plurality of negative base electrodes connected to the negative electrodes. 9. The electrostatic chuck of claim 1 , wherein the target object is a glass substrate. 10. A method of manufacturing an organic light-emitting display apparatus using the electrostatic chuck of claim 1 comprising: generating an electrostatic force between a target object of the organic light-emitting display apparatus and the absorption electrode; and absorbing and supporting the target object on the absorption plate. 11. The method of claim 10 , wherein the electrode width of the second electrode pattern is about 30 to about 50 mm. 12. The method of claim 10 , wherein an electrode gap of the first electrode pattern is about 0.5 to about 1 mm. 13. The method of claim 11 , wherein an area of the second electrode pattern is about 15 to about 25% of a whole area of the absorption electrode. 14. The method of claim 10 , wherein the first electrode pattern comprises alternately aligned positive electrodes and negative electrodes. 15. The method of claim 14 , wherein the first electrode pattern comprises: a plurality of positive base electrodes connected to the positive electrodes; and a plurality of negative base electrodes connected to the negative electrodes. 16. The method of claim 10 , wherein the second electrode pattern comprises alternately aligned electrodes and negative electrodes. 17. The method of claim 16 , wherein the second electrode pattern comprises: a plurality of positive base electrodes connected to the positive electrodes; and a plurality of negative base electrodes connected to the negative electrodes. 18. The method of claim 10 , wherein the target object is a glass substrate.

Assignees

Inventors

Classifications

  • Details of electrostatic chucks · CPC title

  • H02N13/00Primary

    Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect · CPC title

  • H10P72/70Primary

    for supporting or gripping · CPC title

  • Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9287806B2 cover?
Provided is an electrostatic chuck capable of minimizing short circuits of electrodes due to scratches generated on a surface of the electrostatic chuck, and achieving stable absorption.
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H02N13/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).