Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9494869-B2
Application number	US-201214357530-A
Country	US
Kind code	B2
Filing date	Dec 5, 2012
Priority date	Dec 27, 2011
Publication date	Nov 15, 2016
Grant date	Nov 15, 2016

Abstract

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

First claim

The invention claimed is:

1. An exposure apparatus, comprising:
a projection system configured to project a plurality of radiation beams onto a target;
a movable frame that is at least rotatable around an axis;
an actuator system to cause the movable frame to rotate; and
a controller to adjust a position of the movable frame and a modulation or intensity characteristic of at least one of the radiation beams, to compensate at least in part for imbalance of or applied to the movable frame or imbalance of or applied to another movable frame.

2. The apparatus of claim 1 , comprising a plurality of movable frames that are each at least rotatable around an axis and supported by a common frame, wherein the other movable frame is one of the plurality of movable frames.

3. The apparatus of claim 2 , wherein the controller is configured to adjust the position of the movable frame such that a force that the movable frame puts on the common frame in combination with forces put on the common frame by the other movable frames leads to an effective cancellation of the forces.

4. The apparatus of claim 1 , wherein the adjustment of the position of the movable frame comprises a change in phase angle of the movable frame.

5. The apparatus of claim 4 , wherein the change in phase angle comprises a change in phase angle from the angular position of a lens of a plurality of lenses of the movable frame to the angular position of another lens of the plurality of lenses of the movable frame.

6. The apparatus of claim 1 , further comprising a measurement system configured to measure the imbalance of at least one movable frame.

7. The apparatus of claim 6 , wherein the measurement system is configured to obtain a first measurement signal of the at least one movable frame, when disturbed, at a frequency different than its rotating frequency and compare the first measurement signal with a second measurement signal of the at least one movable frame at its rotating frequency to obtain the position of the imbalance.

8. The apparatus of claim 7 , wherein the measurement system is configured to determine the amplitude of the imbalance using the position of the imbalance and the same frequency for both the first and second measurement signals.

9. The apparatus of claim 7 , wherein the measurement system is configured to obtain the first measurement signal at a plurality of different frequencies.

10. The apparatus of claim 6 , wherein the measurement system is configured to determine the imbalance by measuring the position, vibration of and/or force applied to a frame supporting the at least one movable frame.

11. The apparatus of claim 6 , wherein the measurement system is configured to determine the imbalance by measuring radiation projected through a lens of the at least one frame using a radiation sensor.

12. A device manufacturing method comprising:
projecting a plurality of radiation beams onto a target;
rotating a movable frame around an axis using an actuator system; and
adjusting a position of the frame to compensate at least in part for imbalance of or applied to the frame or imbalance of or applied to another movable frame, the adjusting the position of the movable frame comprising changing a phase angle of the movable frame.

13. The method of claim 12 , wherein there are a plurality of movable frames that are each at least rotatable around an axis and supported by a common frame, wherein the other movable frame is one of the plurality of movable frames.

14. An exposure apparatus, comprising:
a projection system configured to project a plurality of radiation beams onto a target;
a plurality of movable frames that are each at least rotatable around a respective axis and supported by a common frame;
an actuator system to cause at least one of the movable frames to rotate; and
a controller to adjust a position of the at least one movable frame to compensate at least in part for imbalance of or applied to the at least one movable frame or imbalance of or applied to another frame of the movable frames, such that a force that the at least one movable frame puts on the common frame in combination with force put on the common frame by the other movable frame leads to an effective cancellation of the forces.

15. The apparatus of claim 14 , wherein the adjustment of the position of the at least one movable frame comprises a change in phase angle of the at least one movable frame.

16. The apparatus of claim 14 , further comprising a measurement system configured to measure the imbalance of at least one movable frame.

17. An exposure apparatus, comprising:
a projection system configured to project a plurality of radiation beams onto a target;
a movable frame that is at least rotatable around an axis;
an actuator system to cause the movable frame to rotate; and
a controller to adjust a position of the movable frame to compensate at least in part for imbalance of or applied to the movable frame or imbalance of or applied to another movable frame, the adjustment of the position of the movable frame comprising a change in phase angle of the movable frame.

18. The apparatus of claim 17 , wherein the change in phase angle comprises a change in phase angle from the angular position of a lens of a plurality of lenses of the movable frame to the angular position of another lens of the plurality of lenses of the movable frame.

19. The apparatus of claim 17 , further comprising a measurement system configured to measure the imbalance of at least one movable frame.

20. The method of claim 12 , further comprising measuring the imbalance of at least one movable frame using a measurement system and the adjusting the position of the movable frame is based on the measurement of the imbalance.

Assignees

• Asml Netherlands Bv

Inventors

• Butler Hans
• Bleeker Arno Jan
• Hennus Pieter Renaat Maria
• Hoeks Martinus Hendricus Henricus
• Hol Sven Antoin Johan
• Van Der Schoot Harmen Klaas
• Slaghekke Bernardus Antonius
• Tinnemans Patricius Aloysius Jacobus
• Van Der Wijst Marc Wilhelmus Maria
• Zaal Koen Jacobus Johannes Maria
• Cadee Theodorus Petrus Maria
• Beerens Ruud Antonius Catharina Maria
• Fischer Olof Martinus Josephus
• Aangenent Wilhelmus Henricus Theodorus Maria
• Bosch Niels Johannes Maria

Classifications

• F16F2230/0011

  Balancing, e.g. counterbalancing to produce static balance · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G03F7/709

  Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title

• G03F7/70558

  Dose control, i.e. achievement of a desired dose · CPC title

• G03F7/70816

  Bearings · CPC title