Lithographic apparatus and device manufacturing method

US9341960B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9341960-B2
Application numberUS-201214356124-A
CountryUS
Kind codeB2
Filing dateNov 14, 2012
Priority dateDec 5, 2011
Publication dateMay 17, 2016
Grant dateMay 17, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

First claim

Opening claim text (preview).

The invention claimed is: 1. An exposure apparatus, comprising: a projection system, configured to project a plurality of radiation beams onto a target; and an image slicer used in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region, wherein the apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions. 2. The apparatus according to claim 1 , wherein the image slicer is a Bowen-Walraven image slicer, or a derivative thereof. 3. The apparatus according to claim 1 , wherein the image slicer comprises: a plate of material that is transmissive to the radiation beams and has first and second substantially parallel surfaces that are at an oblique angle to the radiation beams input to the image slicer; and an input prism having an input face that is substantially perpendicular to the radiation beams input to the image slicer and an interface face that is substantially parallel to and adjoins a part of the first surface of the plate, wherein the image slicer is configured such that the input radiation beams propagate through the input prism to a point at which the input prism adjoins the plate, whereupon the radiation beams propagate through the plate, internally reflecting from the first and second surfaces and not incident on any further points at which the input prism adjoins the plate. 4. The apparatus according to claim 3 , wherein the image slicer further comprises an output prism having an interface face that is substantially parallel to and adjoins a part of the second surface of the plate, wherein the image slicer is configured such that, after a respective number of internal reflections within the plate, each beam of radiation is incident on a point at which the output prism adjoins the plate, whereupon it propagates through the output prism and is output from the image slicer. 5. The apparatus according to claim 4 , wherein: the output prism has an output face that is substantially perpendicular to the radiation beams output from the image slicer; and a separation between adjacent radiation beams output from the image slicer at the output face of the output prism is less than a separation between adjacent radiation beams input to the image slicer at the input face of the input prism. 6. The apparatus according to claim 3 , wherein: the image slicer comprises a second input prism and a second group of radiation beams is input to the image slicer through the second input prism; the second input prism has an input face that is substantially perpendicular to the second group of input radiation beams and an interface face that is substantially parallel to and adjoins a part of the second surface of the plate; and the image slicer is configured such that the second group of input radiation beams propagate through the second input prism to a point at which the second input prism adjoins the plate, whereupon it propagates through the plate, internally reflecting from the first and second surfaces and is not incident on any further points at which the second input prism adjoins the plate. 7. The apparatus according to claim 6 , wherein the first and second input prisms are configured such that the radiation beams input via the first input prism are incident on no points at which the second input prism adjoins the plate and the radiation beams input via the second input prism are incident on no points at which the first input prism adjoins the plate. 8. The apparatus according to claim 6 , wherein the image slicer further comprises an output prism having an interface face that is substantially parallel to and adjoins a part of the second surface of the plate, wherein the image slicer is configured such that, after a respective number of internal reflections within the plate, each beam of radiation is incident on a point at which the output prism adjoins the plate, whereupon it propagates through the output prism and is output from the image slicer, and wherein the radiation beams input via the first and second input prisms are output via the output prism. 9. The apparatus according to claim 6 , wherein: the radiation beams of the first and second groups are plane polarized in mutually orthogonal directions; and the first and second surfaces of the plate are conditioned such that the plane polarized radiation of each of the radiation beams input to the plate via the associated surface of the plate is transmitted into the plate. 10. The apparatus according to claim 3 , wherein the first input prism, the second input prism, or both, is configured such that the interface face comprises a plurality of recesses arranged at points at which a radiation beam is incident on the adjoining surface of the plate and an internal reflection is required. 11. The apparatus according to claim 3 , wherein the first input prism, the second input prism, or both, is configured such that the interface face comprises a plurality of protrusions arranged at points at which a radiation beam is to be transmitted from the respective input prism into the plate. 12. The apparatus according to claim 1 , wherein the image slicer is configured such that, if all of the input radiation beams are substantially parallel to each other, all of the output radiation beams are substantially parallel to each other. 13. The apparatus according to claim 1 , further comprising a programmable patterning device, configured to provide the plurality of radiation beams. 14. The apparatus according to claim 13 , wherein the programmable patterning device comprises a controllable element to selectively provide the beams of radiation. 15. A device manufacturing method comprising: using a projection system to project a plurality of radiation beams onto a target; using an image slicer in an inverted configuration in order to adjust radiation beam paths of the radiation beams, the image slicer in the inverted configuration configured such that, if an input image formed of a plurality of separated image regions is provided to the image slicer, it outputs an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region; and inputting each of the radiation beams into the image slicer at a location corresponding to a respective one of the separated image regions. 16. The method according to claim 15 , wherein the image slicer comprises: a plate of material that is transmissive to the radiation beams and has first and second substantially parallel surfaces that are at an oblique angle to the radiation beams input to the image slicer, and an input prism having an input face that is substantially perpendicular to the radiation beams input to the image slicer and an interface face that is substantially parallel to and adjoins a part of the first surface of the plate; and further comprising propagating the input radiation beams through the input prism to a point at which the input prism adjoins the plate, whereupon the radiation beams propagate through the plate, internally reflecting from the first and second surfaces and not incident on any further points at which the input prism adjoins the plate. 17. The method according to claim 16 , wherein the image slicer further comprises an output prism having an interface face that is substantially parallel to and adjoins

Assignees

Inventors

Classifications

  • The splitting element being a prism or prismatic array, including systems based on total internal reflection · CPC title

  • Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

  • Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning · CPC title

  • Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices · CPC title

  • Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays · CPC title

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What does patent US9341960B2 cover?
An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged…
Who is the assignee on this patent?
Asml Netherlands Bv
What technology area does this patent fall under?
Primary CPC classification G03F7/70275. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).