Mask, exposure apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9563116-B2
Application number	US-201313967688-A
Country	US
Kind code	B2
Filing date	Aug 15, 2013
Priority date	Sep 8, 2006
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

First claim

What is claimed is:

1. An exposure apparatus that transfers an image of a pattern of a mask onto a substrate moving in a predetermined direction by a scanning exposure, the exposure apparatus comprising:
a mask driving apparatus that is configured to rotate a mask about a predetermined axis as a rotation axis, the mask having a body with a circular cylinder shape or a circular column shape, the mask having a patterned area and a pair of scale marks for a measurement with an encoder, the patterned area having the pattern and being formed along a circumferential surface of the body, the circumferential surface having a circular cylinder shape that is defined with a constant radius with respect to the predetermined axis, the pair of scale marks being formed along the circumferential surface and arranged at both areas between the patterned area and both axial ends of the circumferential surface, the pair of scale marks being provided substantially all around the circumferential surface and each having a predetermined positional relationship with respect to the patterned area;
an illumination apparatus that is configured to provide exposure light onto the circumferential surface of the mask, an illumination area of the exposure light having a substantially rectangular shape that has a longitudinal axis along the predetermined axis;
a detection system that is configured to acquire position information relating to the pattern, the detection system having a first encoder system and a second encoder system, the first encoder system being arranged so as to face a first scale mark of the pair of scale marks and to measure a position of the first scale mark in a rotation direction about the predetermined axis, and the second encoder system being arranged so as to face a second scale mark of the pair of scale marks and to measure a position of the second scale mark in a rotation direction about the predetermined axis; and
a substrate driving apparatus that moves the substrate at a predetermined speed so that the pattern is continuously exposed in a scanning exposure direction on the substrate, wherein
the mask driving apparatus controls the driving of the mask around the predetermined axis when an image of a pattern of the mask is scanning exposed onto the substrate based on position information in the rotation direction acquired by the first encoder system and the second encoder system, and
the mask driving apparatus controls a speed of the circumferential surface of the mask which is obtained based on position information in the rotation direction acquired by the first encoder system or the second encoder system and a pitch of the scale marks in a rotation direction so that a speed of the substrate synchronizes with the speed of the circumferential surface of the mask.

2. The exposure apparatus according to claim 1 , wherein each of the first encoder system and the second encoder system is an optical encoder which projects light onto the scale marks and detects reflected light by a light receiving device.

3. The exposure apparatus according to claim 2 , wherein each of the first scale mark and the second scale mark is an incremental type or an absolute type.

4. The exposure apparatus according to claim 2 , wherein
each of the first scale mark and the second scale mark has a diffraction grating which contains two-dimensional position information in the rotation direction and in a direction along the predetermined axis, and is formed along the circumferential surface of the mask, and
each of the first encoder system and the second encoder system has a plurality of light receiving elements which measure two-dimensional position in the rotation direction and in the direction along the predetermined axis of the circular cylinder shape mask, and acquire position information in directions of three degrees of freedom of the pattern on the mask based on two-dimensional position information from the plurality of the light receiving elements.

5. The exposure apparatus according to claim 4 , wherein
the detection system has an optical focus and leveling detection system which detects a position change in directions of three degrees of freedom of a predetermined area which comprises an illumination area on the circumferential surface of the mask irradiated by the exposure light from the illumination apparatus, and
the detection system acquires position information in directions of six degrees of freedom of the pattern on the mask together with the position information in directions of three degrees of freedom acquired by the first encoder system and the second encoder system.

6. The exposure apparatus according to claim 1 , wherein
each of the first encoder system and the second encoder system are arranged so as to face each of the first scale mark and the second scale mark, respectively, separated from each other in a direction of a line which is in parallel with the predetermined axis which becomes a center of a rotation of the mask.

7. The exposure apparatus according to claim 1 , further comprising:
a projection optical system,
wherein a plurality of alignment marks are intermittently arranged in the rotation direction on the mask in a positional relationship which is defined with respect to the pattern within the patterned area, and
the projection optical system is capable of projecting a part of the pattern within the patterned area of the mask irradiated by the exposure light from the illumination apparatus, and the alignment marks, toward the substrate at a predetermined projection ratio.

8. The exposure apparatus according to claim 7 , wherein
the detection system comprises a light receiving device that receives light from the alignment marks via the projection optical system.

9. The exposure apparatus according to claim 1 , further comprising:
a substrate holding member that is capable of holding a plurality of removable substrates and that is arranged to be driven, by the substrate driving apparatus, at a predetermined speed so that the pattern is continuously exposed in a scanning exposure direction on the substrate; and
a substrate driving apparatus that drives the substrate holding member,
wherein, when a length in the direction of the scanning exposure of the substrate is taken as L, and a diameter of the circumferential surface of the mask is taken as D, and a projection ratio is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

10. The exposure apparatus according to claim 1 , wherein
the mask has a reference mark, which corresponds to a start position in the rotation direction of the patterned area, at a predetermined position in the rotation direction,
the detection system comprises a light receiving device that optically detects the reference mark in order to acquire information regarding a rotation start position when the mask rotates in a synchronized manner with a movement of the substrate.

11. A device manufacturing method, wherein
the substrate is a glass substrate or a film member, and
the device manufacturing method exposes a pattern formed on the mask onto the glass substrate or the film member by using the exposure apparatus according to claim 1 .

12. An exposure method of transferring an image of a pattern of a mask onto a substrate moving in a predetermined direction by a scanning exposure, the exposure method comprising:
irradiating exposure light onto a mask rotating about a predetermined axis as a center, the mask having a body with a circular cylinder shape or a circular column shape, the mask having a patterned area and a pair of scale marks for a measurement with first and second encoder system

Assignees

• Nikon Corp

Inventors

• Shibazaki Yuichi

Classifications

• G03F7/70358

  Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging · CPC title

• G03F9/7023

  Aligning or positioning in direction perpendicular to substrate surface · CPC title

• G03F9/00

  Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/703 Primary

  Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates · CPC title

• G03F7/2035

  simultaneous coating and exposure; using a belt mask, e.g. endless · CPC title