Exposure device / tool for circuits on curved surfaces and method for preparing curved circuits
US-2026044084-A1 · Feb 12, 2026 · US
Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/703 |
| Official title | {Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates} |
| Display label | Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates |
| Total patents | 59 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 8 |
| 2016 | 14 |
| 2017 | 5 |
| 2018 | 6 |
| 2019 | 2 |
| 2020 | 8 |
| 2021 | 6 |
| 2022 | 3 |
| 2023 | 3 |
| 2024 | 2 |
| 2025 | 1 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Film formation device, film formation method, and article manufacturing method
US-12313977-B2 · May 27, 2025 · US
Drawing apparatus and drawing method
US-2024168386-A1 · May 23, 2024 · US
Optical objective for operation in EUV spectral region
US-11934105-B2 · Mar 19, 2024 · US
Method of fabrication and control of nano-structure array by angle-resolved exposure in proximity-field nano patterning
US-11837470-B2 · Dec 5, 2023 · US
Secondary imaging optical lithography method and apparatus
US-11693320-B2 · Jul 4, 2023 · US
Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same
US-11662659-B2 · May 30, 2023 · US
Film formation device, film formation method, and article manufacturing method
US-2022357667-A1 · Nov 10, 2022 · US
Conformal stage
US-11353800-B2 · Jun 7, 2022 · US
Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same
US-2022128900-A1 · Apr 28, 2022 · US
Flexible mask modulation for controlling atmosphere between mask and substrate and methods of using the same
US-11198235-B2 · Dec 14, 2021 · US
Method of fabrication and control of nano-structure array by angle-resolved exposure in proximity-field nano patterning
US-2021335601-A1 · Oct 28, 2021 · US
Negative refraction imaging lithographic method and equipment
US-2021200079-A1 · Jul 1, 2021 · US
Film mask, method for manufacturing same, and method for forming pattern using film mask
US-10969677-B2 · Apr 6, 2021 · US
Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US-10969686-B2 · Apr 6, 2021 · US
Dynamic imaging system
US-10948834-B2 · Mar 16, 2021 · US
Conformal stage
US-2020401055-A1 · Dec 24, 2020 · US
Dynamic imaging system
US-2020333711-A1 · Oct 22, 2020 · US
Dynamic imaging system
US-10719018-B2 · Jul 21, 2020 · US
Maskless exposure method, maskless exposure apparatus and method of manufacturing a semiconductor device using the same
US-10670968-B2 · Jun 2, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/703?
- CPC G03F7/703 is the Cooperative Patent Classification code for “Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates.”
- How many patents are filed under CPC G03F7/703 (Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates)?
- Our database includes 59 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/703 growing?
- Publication counts under this code: 2 in 2024 vs 1 in 2025 (latest complete years).