Application of metallic glass coating for improving fatigue resistance of aluminum alloys

Patent metadata

Field	Value
Publication number	US-9339990-B2
Application number	US-201213667947-A
Country	US
Kind code	B2
Filing date	Nov 2, 2012
Priority date	Nov 2, 2011
Publication date	May 17, 2016
Grant date	May 17, 2016

Abstract

A Zr-based or Zr—Cu based metallic glass thin film (MGTF) coated on aluminum alloy substrate and a method of fabricating the metallic glass and MGTF coated on aluminum alloy substrate are disclosed. The Zr-based metallic glass thin film-coated aluminum alloy substrate of the present invention comprises: an aluminum alloy substrate; and a Zr-based metallic glass thin film located on the substrate, in which the Zr-based metallic glass is represented by the formula of (Zr a Cu b Ni c Al d ) 100-x Si x , wherein 45=<a=<75, 25=<b=<35, 5=<c=<15, 5=<d=<15, 0.1=<x=<10. The Zr—Cu-based metallic glass thin film coated substrate of the present invention comprises: an aluminum alloy substrate; a Zr—Cu-based metallic glass thin film located on the aluminum alloy substrate, in which the Zr—Cu-based metallic glass is represented by the formula of (Zr e Cu f Al g Ag h ) 100-y Si y , wherein 35=<e=<55, 35=<f=<55, 5=<g=<15, 5=<h=<15, 0.1=<y=<10.

First claim

What is claimed is:

1. A substrate coated with zirconium-copper-based metallic glass thin film, which comprises:
a substrate made of aluminum alloy; and
a zirconium-copper-based metallic glass thin film made of zirconium-copper-based metallic glass, which locates on the surface of the substrate, and the zirconium-copper-based metallic glass is formed by sputtering a zirconium-copper-based metallic glass target represented by the following formula 2,
wherein formula 2 is
(Zr e Cu f Al g Ag h ) 100-y Si y ,

wherein 35≦e≦55, 35≦f≦55, 5≦g≦15, 5≦h≦15, and 0.1≦y≦10.

2. The substrate coated with zirconium-copper-based metallic glass thin film as claimed in claim 1 , wherein the fatigue life of the substrate coated with zirconium-copper-based metallic glass thin film is 1×10 6 to 1×10 9 times with stress of 250 MPa measured by a curving fatigue test.

3. The substrate coated with zirconium-copper-based metallic glass thin film as claimed in claim 1 , wherein fatigue endurance of the substrate coated with zirconium-copper-based metallic glass thin film is 200 MPa to 300 MPa.

4. The substrate coated with zirconium-copper-based metallic glass thin film as claimed in claim 1 , wherein the thickness of the zirconium-copper-based metallic glass thin film is 100 nm to 500 nm.

5. The substrate coated with zirconium-copper-based metallic glass thin film as claimed in claim 1 , wherein the hardness of the substrate coated with zirconium-copper-based metallic glass thin film is 4 GPa to 6 GPa.

6. The substrate coated with zirconium-copper-based metallic glass thin film as claimed in claim 1 , wherein the Young's modulus of the substrate coated with zirconium-copper-based metallic glass thin film is 85 GPa to 105 GPa.

7. A method of forming a zirconium-copper-based metallic glass thin film of claim 1 , comprising steps:
(A) providing said zirconium-copper-based metallic glass target made of zirconium-based metallic glass, wherein the zirconium-copper-based metallic glass target is provided by the following steps:
(A1) forming an ingot by using raw materials in a composition according to said target composition; and
(A2) vacuum suction casting the ingot to form said zirconium-copper-based metallic glass target; and
(B) sputtering to form a zirconium-copper-based metallic glass thin film on a substrate by using said zirconium-copper-based metallic glass target as a cathode, in which the substrate is made of aluminum alloy.

8. The method of forming a zirconium-copper-based metallic glass thin film as claimed in claim 7 , wherein in step (B), the thickness of the zirconium-copper-based metallic glass thin film is 100 nm to 500 nm.

9. The method of forming a zirconium-copper-based metallic glass thin film as claimed in claim 7 , wherein in step (B), the sputtering step is performed with a gas pressure of 1×10 −4 Pa to 1×10 −2 Pa.

10. The method of forming a zirconium-copper-based metallic glass thin film as claimed in claim 7 , wherein the hardness of the substrate coated with zirconium-copper-based metallic glass thin film is 4 GPa to 6 GPa.

11. The method of forming a zirconium-copper-based metallic glass thin film as claimed in claim 7 , wherein the Young's modulus of the substrate coated with zirconium-copper-based metallic glass thin film is 85 GPa to 105 GPa.

Assignees

• Univ Nat Central

Inventors

• Jang Jason Shiang Ching
• Tsai Pei Hua
• Li jia bin
• Zhang yi zong
• Fu Chih Chiang
• Chu Jinn P

Classifications

• C22C1/11

  Making amorphous alloys · CPC title

• Y10T428/12736

  Al-base component · CPC title

• C23C14/185

  by cathodic sputtering · CPC title

• Y10T428/12806

  Refractory [Group IVB, VB, or VIB] metal-base component · CPC title

• Y10T428/12993

  Surface feature [e.g., rough, mirror] · CPC title