Substrate with antireflection coating and method for producing same
US-11906700-B2 · Feb 20, 2024 · US
by cathodic sputtering
by cathodic sputtering · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C14/185 |
| Official title | {by cathodic sputtering} |
| Display label | by cathodic sputtering |
| Total patents | 792 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 47 |
| 2016 | 81 |
| 2017 | 86 |
| 2018 | 104 |
| 2019 | 87 |
| 2020 | 89 |
| 2021 | 69 |
| 2022 | 62 |
| 2023 | 56 |
| 2024 | 60 |
| 2025 | 40 |
| 2026 | 11 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Substrate for pattern formation
US-11898008-B2 · Feb 13, 2024 · US
Method for forming conductive mesh pattern, and mesh electrode and laminate manufactured thereby
US-2016378241-A1 · Dec 29, 2016 · US
Silver nanoparticles on conducting electrode as plasmonic scattering nanomaterial and related photovoltaic cells
US-2016343887-A1 · Nov 24, 2016 · US
Method of manufacturing nano gap sensor using residual stress and nano gap sensor manufactured thereby
US-2016341688-A1 · Nov 24, 2016 · US
Wiring film for flat panel display
US-2016345425-A1 · Nov 24, 2016 · US
Fabrication of low defectivity electrochromic devices
US-2016327846-A1 · Nov 10, 2016 · US
Fabrication of low defectivity electrochromic devices
US-9429809-B2 · Aug 30, 2016 · US
Low-e panels and methods for forming the same
US-9416049-B2 · Aug 16, 2016 · US
Metal gate and manufacutring method thereof
US-2016211339-A1 · Jul 21, 2016 · US
Low-e panels with ternary metal oxide dielectric layer and method for forming the same
US-9315414-B2 · Apr 19, 2016 · US
Substrate with antireflection coating and method for producing same
US-9296648-B2 · Mar 29, 2016 · US
Physical vapor deposition of low-stress nitrogen-doped tungsten films
US-2016035569-A1 · Feb 4, 2016 · US
METHODS TO IMPROVE THE CRYSTALLINITY OF PbZrTiO3 AND Pt FILMS FOR MEMS APPLICATIONS
US-2015380635-A1 · Dec 31, 2015 · US
Multilayer ceramic electronic component to be embedded in board, manufacturing method thereof and printed circuit board having the same embedded therein
US-2015380161-A1 · Dec 31, 2015 · US
Low-E Panels and Methods for Forming the Same
US-2015368152-A1 · Dec 24, 2015 · US
Methods for depositing a layer on a substrate using surface energy modulation
US-9217197-B2 · Dec 22, 2015 · US
Coating apparatus and method
US-9211563-B2 · Dec 15, 2015 · US
Hard anti-reflective coatings and manufacturing and use thereof
US-2015355382-A1 · Dec 10, 2015 · US
Method of forming an exterior mirror reflector sub-assembly with auxiliary reflector portion
US-2015343952-A1 · Dec 3, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C14/185?
- CPC C23C14/185 is the Cooperative Patent Classification code for “by cathodic sputtering.”
- How many patents are filed under CPC C23C14/185 (by cathodic sputtering)?
- Our database includes 792 publications tagged with this CPC code.
- Is patent activity under CPC C23C14/185 growing?
- Publication counts under this code: 60 in 2024 vs 40 in 2025 (latest complete years).