Semiconductor processing apparatus and sealing device
US-11538696-B2 · Dec 27, 2022 · US
US12472596B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12472596-B2 |
| Application number | US-202217862601-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 12, 2022 |
| Priority date | Jul 19, 2021 |
| Publication date | Nov 18, 2025 |
| Grant date | Nov 18, 2025 |
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The present invention provides a substrate treating apparatus, including: a treatment container having a treatment space therein; a support unit for supporting and rotating the substrate in the treatment space; and a liquid supply unit for supplying a liquid onto the substrate, in which wherein the support unit includes: a body on which the substrate is seated; and a support shaft coupled to the body, and an upper surface of the body is provided with a central portion including a center of the body and an edge portion surrounding the central portion, and a vacuum hole is formed in the central portion, and a groove is formed in the edge portion.
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What is claimed is: 1 . A substrate treating apparatus, comprising: a treatment container having a treatment space therein; a support unit configured to support and rotate a substrate in the treatment space; and a liquid supply unit configured to supply a liquid on the substrate, wherein the support unit includes a body on which the substrate is seated; and a support shaft coupled to the body, an upper surface of the body has a central portion including a center of the body and an edge portion surrounding the central portion, the edge portion extending from the central portion to an end of the body, and the central portion defines a vacuum hole, and the edge portion defines a groove, wherein the upper surface of the body has a smaller area than the substrate when viewed from a top view, an upper surface of the central portion is lower than an upper surface of the edge portion, a support protrusion configured to support the substrate is on the upper surface of the central portion, and at least a portion of the upper surface of the edge portion and an upper end of the support protrusion are at a same height. 2 . The substrate treating apparatus of claim 1 , wherein the groove has a slit shape. 3 . The substrate treating apparatus of claim 2 , wherein the slit shape groove has a ring shape along a circumference of the edge portion. 4 . The substrate treating apparatus of claim 3 , wherein the slit shape groove has a first side surface and a second side surface located farther from the center of the body than the first side surface when viewed from a cross-section cut in a width direction of the slit shape groove. 5 . The substrate treating apparatus of claim 4 , wherein the first side surface and the second side surface are parallel to an axial direction of the support shaft. 6 . The substrate treating apparatus of claim 4 , wherein the first side surface is parallel to an axial direction of the support shaft, and the second side surface is inclined upwardly in a direction away from the axial direction of the support shaft. 7 . The substrate treating apparatus of claim 5 , wherein in the slit shape groove, a protrusion protruding in a direction away from the center of the body is on an upper portion of the first side surface. 8 . The substrate treating apparatus of claim 4 , wherein the slip shape groove comprises a plurality of slits, the plurality of slits are spaced apart from each other in a direction to the central portion in the edge portion, and the plurality of slits have different shapes from each other. 9 . The substrate treating apparatus of claim 8 , wherein the slit shape groove has any one of: a first shape in which the first side surface and the second side surface are parallel to an axial direction of the support shaft; a second shape in which the first side surface is parallel to the an axial direction of the support shaft, and the second side surface is inclined upwardly in a direction away from the axial direction of the support shaft; a third shape in which the first side surface and the second side surface are parallel to the an axial direction of the support shaft, and a protrusion that protrudes in a direction away from the a center of the support shaft is on an upper end of the first side surface; and a fourth shape in which the first side surface is parallel to the an axial direction of the support shaft, and the second side surface is inclined upwardly in the a direction away from the axial direction of the support shaft, and a protrusion that protrudes in a direction away from a center of the support shaft is on the an upper end of the first side surface. 10 . The substrate treating apparatus of claim 1 , wherein a portion surrounded by the edge portion is a decompression space in which the substrate is adsorbed by the vacuum hole, and an inner space of the groove is an airflow trapping space in which an external airflow introduced between the substrate and the upper surface of the edge portion stays. 11 . A support unit for supporting and rotating a substrate, the support unit comprising: a body on which the substrate is seated; and a support shaft coupled to the body with a vacuum flow path therein, wherein an upper surface of the body has a central portion including a center of the body and an edge portion surrounding the central portion, the edge portion extending from the central portion to an end of the body, a vacuum hole communicating with one end of the vacuum flow path is in a center of the central portion, and a ring-shaped groove is along a circumference of the edge portion, and the ring-shaped groove has a first side surface and a second side surface located farther from the center of the body than the first side surface when viewed from a cross-section cut in a width direction of the ring-shaped slit, wherein in the ring-shaped groove, a protrusion protruding in a direction away from the center of the body is on an upper portion of the first side surface. 12 . The support unit of claim 11 , wherein the first side surface and the second side surface are parallel to an axial direction of the support shaft. 13 . The support unit of claim 11 , wherein the first side surface is parallel to an axial direction of the support shaft, and the second side surface is inclined upwardly in a direction away from the axial direction of the support shaft. 14 . The support unit of claim 11 , wherein the upper surface of the body has a smaller area than the substrate when viewed from a top view. 15 . The support unit of claim 14 , wherein an upper surface of the central portion is lower than an upper surface of the edge portion and includes a support protrusion configured to support the substrate, and the upper surface of the edge portion and an upper end of the support protrusion are at a same height with respect to ground. 16 . The support unit of claim 15 , wherein the ring-shaped groove comprises a plurality of slits, the plurality of slits are spaced apart from each other in a direction to the central portion in the edge portion, and the plurality of slits have different shapes from each other. 17 . A substrate treating apparatus, comprising: a housing having an inner space; a treatment container positioned within the inner space and having a treatment space; a support unit configured to support and rotate a substrate in the treatment space; a liquid supply unit configured to supply a liquid onto the substrate; and an airflow supply unit coupled to an upper surface of the housing and configured to supply gas forming a downward airflow to the inner space, wherein the support unit includes a body on which the substrate is seated; and a support shaft coupled to the body with a vacuum flow path therein, and an upper surface of the body has a central portion including a center of the body and an edge portion surrounding the central portion, a vacuum hole communicating with one end of the vacuum flow path is in a center of the central portion, an upper surface of the central portion is lower than an upper surface of the edge portion and includes a support protrusion configured to support the substrate, a ring-shaped groove is along a circumference of the edge portion, and the ring-shaped groove has a first side surface and a second side surface located farther from the center of the body than the first side surface when viewed from a cross-section cut in a width direction of the ring-shaped groove. 18 . The substrate tr
characterised by edge profile or support profile · CPC title
characterised by the mechanical construction of the susceptor, stage or support · CPC title
characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title
using vacuum or suction, e.g. Bernoulli chucks · CPC title
adapted for holding workpieces having a special form or being made from a special material · CPC title
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