Ag alloy bonding wire for semiconductor device
US-11612966-B2 · Mar 28, 2023 · US
US12463172B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12463172-B2 |
| Application number | US-202117916935-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 29, 2021 |
| Priority date | Apr 7, 2020 |
| Publication date | Nov 4, 2025 |
| Grant date | Nov 4, 2025 |
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There is provided an Ag alloy bonding wire for semiconductor devices which exhibits a favorable bond reliability in a high-temperature environment even when using a mold resin of high S content and can suppress a chip damage at the time of ball bonding. The Ag alloy bonding wire is characterized by containing at least one element selected from the group consisting of Pd and Pt (hereinafter referred to as a “first element”) and at least one element selected from the group consisting of P, Cr, Zr and Mo (hereinafter referred to as a “second element”) so as to satisfy 0.05≤x1≤3.0, and 15≤x2≤700 where x1 is a total concentration of the first element [at. %] and x2 is a total concentration of the second element [at. ppm], with the balance including Ag.
Opening claim text (preview).
The invention claimed is: 1 . An Ag alloy bonding wire for semiconductor devices, comprising at least one first element selected from the group consisting of Pd and Pt and at least one second element selected from the group consisting of P, Cr, Zr and Mo so as to satisfy 0.05≤x1≤3.0, and 15≤x2≤700 where x1 is a total concentration of the first element by atomic percentage and x2 is a total concentration of the second element by atomic ppm, with the balance comprising Ag, wherein the Ag alloy bonding wire comprises at least Cr, Zr or Mo as the second element. 2 . The Ag alloy bonding wire according to claim 1 , wherein a total concentration of In, Ga, Cd, and Sn is 0 atomic percent or more and less than 0.05 atomic percent. 3 . The Ag alloy bonding wire according to claim 1 , wherein a total concentration of elements other than the first element, the second element, and Ag is 0 atomic percent or more and less than 0.05 atomic percent. 4 . The Ag alloy bonding wire according to claim 1 , wherein the concentration of each element is measured by an ICP emission spectrometry or an ICP mass spectrometry. 5 . The Ag alloy bonding wire according to claim 1 , wherein the Ag alloy bonding wire does not have a coating that contains a metal other than Ag as a main component. 6 . A semiconductor device comprising the Ag alloy bonding wire according to claim 1 . 7 . The Ag alloy bonding wire according to claim 1 , further comprising In, Ga, Cd, or Sn, wherein a total concentration of In, Ga, Cd, and Sn is more than 0 atomic percent and less than 0.05 atomic percent. 8 . The Ag alloy bonding wire according to claim 1 , further comprising In, Ga, Cd, or Sn, wherein a total concentration of In, Ga, Cd, and Sn is more than 0 atomic percent and less than 0.045 atomic percent.
the connected ends being wedge-shaped · CPC title
Thermally treating · CPC title
comprising metals or metalloids, e.g. silver · CPC title
the connected ends being ball-shaped · CPC title
of bond wires · CPC title
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