Composition for layered transition metal chalcogenide compound layer and method of forming layered transition metal chalcogenide compound layer
US-10079144-B2 · Sep 18, 2018 · US
US11760768B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11760768-B2 |
| Application number | US-202117236020-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 21, 2021 |
| Priority date | Apr 21, 2021 |
| Publication date | Sep 19, 2023 |
| Grant date | Sep 19, 2023 |
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Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.
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What is claimed is: 1. A metal coordination complex comprising molybdenum(0) and having a structure selected from the group consisting of: Mo(CO) n (CNMe) (6-n) wherein n is from 1 to 3, Mo(CO) n (Py) (6-n) wherein n is from 1 to 3, Mo(CO)n(SMe 2 ) (6-n) wherein n is from 1 to 3, wherein n is from 1 to 3, wherein the metal coordination complex is substantially free of halogen and substantially free of a Mo-O bond, and wherein L is selected from the group consisting of a 2n-electron donor neutral monodentate ligand, a 2n-electron donor neutral bidentate ligand, a 2n-electron donor neutral tridentate ligand, and combinations thereof.
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characterized by the use of precursors specially adapted for ALD · CPC title
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