Molybdenum(0) precursors for deposition of molybdenum films

US11760768B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11760768-B2
Application numberUS-202117236020-A
CountryUS
Kind codeB2
Filing dateApr 21, 2021
Priority dateApr 21, 2021
Publication dateSep 19, 2023
Grant dateSep 19, 2023

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal coordination complex comprising molybdenum(0) and having a structure selected from the group consisting of: Mo(CO) n (CNMe) (6-n) wherein n is from 1 to 3, Mo(CO) n (Py) (6-n) wherein n is from 1 to 3, Mo(CO)n(SMe 2 ) (6-n) wherein n is from 1 to 3, wherein n is from 1 to 3, wherein the metal coordination complex is substantially free of halogen and substantially free of a Mo-O bond, and wherein L is selected from the group consisting of a 2n-electron donor neutral monodentate ligand, a 2n-electron donor neutral bidentate ligand, a 2n-electron donor neutral tridentate ligand, and combinations thereof.

Assignees

Inventors

Classifications

  • C07F11/00Primary

    Compounds containing elements of Groups 6 or 16 of the Periodic Table · CPC title

  • C07F11/005Primary

    compounds without a metal-carbon linkage · CPC title

  • Complexes or chelates of phosphines with metallic compounds or metals · CPC title

  • characterized by the use of precursors specially adapted for ALD · CPC title

  • from metallo-organic compounds · CPC title

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What does patent US11760768B2 cover?
Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be seq…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C07F11/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 19 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).