Selective deposition processes on semiconductor substrates
US-12593629-B2 · Mar 31, 2026 · US
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Saly Mark patents
Saly Mark is listed as an inventor on 222 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Saly Mark |
| Total patents | 222 |
| First publication | Jan 6, 2015 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Methods of forming interconnect structures
US-12568803-B2 · Mar 3, 2026 · US
Molybdenum (0) Precursors For Deposition Of Molybdenum Films
US-2026042789-A1 · Feb 12, 2026 · US
Deposition of rhenium-containing thin films
US-12545998-B2 · Feb 10, 2026 · US
Chlorine-free removal of molybdenum oxides from substrates
US-12543523-B2 · Feb 3, 2026 · US
Alkynes and alkenes for blocking film deposition on silicon
US-2026026270-A1 · Jan 22, 2026 · US
Methods of depositing silicon-containing films for semiconductor devices
US-2026011547-A1 · Jan 8, 2026 · US
Molybdenum (0) precursors for deposition of molybdenum films
US-12473316-B2 · Nov 18, 2025 · US
Metal organonitrile precursors for thin film deposition
US-12435411-B2 · Oct 7, 2025 · US
Method for forming conformal silicon oxide thin film
US-2025299946-A1 · Sep 25, 2025 · US
Recent patents
Latest publications not already listed above.
Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structures
US-2025293017-A1 · Sep 18, 2025 · US
Molybdenum(0) precursors for deposition of molybdenum films
US-12415824-B2 · Sep 16, 2025 · US
Methods of manufacturing interconnect structures
US-2025259886-A1 · Aug 14, 2025 · US
Method of depositing metal films
US-2025250675-A1 · Aug 7, 2025 · US
Methods of manufacturing interconnect structures
US-2025253191-A1 · Aug 7, 2025 · US
Methods of manufacturing interconnect structures
US-2025233015-A1 · Jul 17, 2025 · US
Methods of selective atomic layer deposition
US-2025230545-A1 · Jul 17, 2025 · US
Selective deposition of capping layer
US-2025218867-A1 · Jul 3, 2025 · US
Selective blocking of metal surfaces using n-heterocyclic carbenes as selfassembled monolayers
US-2025157855-A1 · May 15, 2025 · US
Etching of metal oxides using fluorine and metal halides
US-12300503-B2 · May 13, 2025 · US
Methods of selective atomic layer deposition
US-12291779-B2 · May 6, 2025 · US
Chlorine-free removal of molybdenum oxides from substrates
US-2025132165-A1 · Apr 24, 2025 · US
Methods for depositing blocking layers on conductive surfaces
US-12281382-B2 · Apr 22, 2025 · US
Method of depositing metal films
US-12281387-B2 · Apr 22, 2025 · US
Oligomer film for bottom-up gap fill processes
US-2025125195-A1 · Apr 17, 2025 · US
Selective metal removal with flowable polymer
US-12272551-B2 · Apr 8, 2025 · US
Selective etch of a substrate
US-12261049-B2 · Mar 25, 2025 · US
Dry development for metal-oxide photoresists
US-2025028248-A1 · Jan 23, 2025 · US
Selective deposition processes on semiconductor substrates
US-2025006485-A1 · Jan 2, 2025 · US
Flexible monomer for smooth polymer surface
US-2025006555-A1 · Jan 2, 2025 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 219 |
| Nat Univ Singapore | 13 |
| Univ Wayne State | 11 |
| Sigma Aldrich Co Llc | 2 |
| Varian Semiconductor Equipment Ass Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/45553 | 116 |
| H10P14/6339 | 115 |
| C23C16/56 | 70 |
| H01L21/0228 | 70 |
| H10P14/6336 | 64 |