Apparatus and method for atomic layer deposition

Patent metadata

Field	Value
Publication number	US-11549180-B2
Application number	US-200913060435-A
Country	US
Kind code	B2
Filing date	Aug 25, 2009
Priority date	Aug 27, 2008
Publication date	Jan 10, 2023
Grant date	Jan 10, 2023

Abstract

Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.

First claim

The invention claimed is:

1. An apparatus for atomic layer deposition on a substrate surface, the apparatus comprising:
a precursor injector head, the precursor injector head comprising one or more precursor supplies and a deposition space that in use is bounded by the precursor injector head and the substrate surface, wherein the precursor injector head is arranged for injecting a precursor gas from the one or more precursor supplies into the deposition space for contacting the substrate surface to yield injected precursor gas, wherein the apparatus is arranged for relative motion between the deposition space and the substrate surface in a plane of the substrate surface,
wherein the precursor injector head comprises a gas injector for injecting a gas between the precursor injector head and the substrate surface, the gas thus forming a gas-bearing layer, wherein the apparatus is further arranged for relative motion between the precursor injector head and the substrate surface in a plane out of the substrate surface that is dependent on a pressure of the gas between the substrate surface and the precursor injector head,
wherein the gas injector is formed by a bearing-gas injector, which is separate from the one or more precursor supplies, for creating the gas-bearing layer, and in that the precursor injector head is provided with projecting portions, wherein, in use, the gas-bearing layer is formed between the projecting portions and a substrate for increasing the pressure in the gas bearing layer, the gas-bearing layer and the projecting portions thereby forming a confining structure for confining the injected precursor gas to the deposition space adjacent to the substrate surface, and wherein a thickness of the gas-bearing layer is less than a thickness of the deposition space measured in a plane out of the substrate surface,
wherein the precursor injector head further comprises at least one precursor drain arranged for draining the precursor gas, wherein the at least one precursor drain is configured to drain within the confining structure on at least two sides of the at least one of the one or more precursor supplies in the deposition space, and
wherein the precursor injector head further comprises a deposition space pressure controller and a gas-bearing layer pressure controller, both the deposition space pressure controller and the gas-bearing layer pressure controller configured to control the precursor injector head to float on the substrate surface within a defined range or at a defined distance, wherein the deposition space pressure controller sets a pre-stressing force by setting a total pressure in the deposition space and wherein the gas-bearing layer pressure controller counteracts the pre-stressing force by controlling a pressure in the gas-bearing layer, and wherein the precursor injector head is smaller than a size of the substrate.

2. The apparatus according to claim 1 , wherein said pre-stressing force, in use, being formed by at least one of a total gas pressure in the deposition space being below a pressure in an outer environment of the precursor injector head; magnetically; gravitationally by an added weight to the precursor injector head; a spring or another elastic element; and/or separate from the pressure in the deposition space, an applied gas pressure in between the precursor injector head and the substrate that is below the pressure in the outer environment of the precursor injector head.

3. The apparatus according to claim 1 , wherein the confining structure is further formed by a flow barrier for the precursor gas along an outer flow path arranged, in use, between the precursor injector head and the substrate surface to an outer environment, for substantially impeding a volumetric flow rate of the precursor gas along the outer flow path compared to a volumetric flow rate of the injected precursor gas.

4. The apparatus according to claim 3 , wherein the gas bearing layer forms the flow barrier.

5. The apparatus according to claim 4 , wherein the flow barrier is formed by a confining gas curtain and/or a confining gas pressure in the outer flow path.

6. The apparatus according to claim 3 , wherein the flow barrier is formed by a flow gap between the precursor injector head and the substrate surface and/or between the precursor injector head and a surface that extends from the substrate surface in a plane of the substrate surface, wherein a thickness and length of the flow gap along the outer flow path are adapted for substantially impeding the volumetric flow rate of the precursor gas along the outer flow path compared to the volumetric flow rate of the injected precursor gas.

7. The apparatus according to claim 3 , wherein the flow barrier is formed by a confining gas curtain and/or a confining gas pressure in the outer flow path.

8. The apparatus according to claim 1 , wherein, in use, and as a result of the precursor injector head being provided with the projecting portions and the gas-bearing layer being formed between the projecting portions and the substrate and/or being formed between the projecting portions and a substrate holder surface of a substrate holder, a thickness of the gas-bearing layer is less than a thickness of the deposition space, measured in a plane out of the substrate surface.

9. The apparatus according to claim 8 , wherein, in use, the thickness of the gas-bearing layer is in a range from 3 to 15 micrometer, and/or the thickness of the deposition space out of the plane of the substrate surface is in a range from 3 to 100 micrometer.

10. The apparatus according to claim 1 , wherein the one or more precursor supplies are formed by a slit having an undulated shape.

11. The apparatus according to claim 1 , arranged for providing a plasma in a reaction space for reacting the one or more precursor supplies with reactant gas after deposition of the precursor gas on at least part of the substrate surface in order to obtain an atomic layer on the at least part of the substrate surface.

12. The apparatus according to claim 1 , wherein the confining structure is further formed by the projecting portions of the precursor injector head.

13. The apparatus according to claim 1 , wherein the projecting portions are provided with a bearing-gas supply.

14. The apparatus according to claim 1 , wherein the deposition space has a planar or curved elongated shape in the plane of the substrate surface.

15. The apparatus according to claim 1 , wherein the precursor injector head is arranged for injecting the precursor gas from the one or more precursor supplies via the deposition space to the precursor drain, wherein the projecting portions are free of the precursor drain.

16. The apparatus according to claim 1 , wherein the apparatus further comprises a drain flow path extending from the at least one precursor drain, and arranged for substantially facilitating a volumetric flow rate of the precursor gas along the drain flow path.

17. The apparatus according to claim 1 , wherein the at least one precursor drain is circumferentially arranged around the one or more precursor supplies in the deposition space.

18. The apparatus according to claim 1 , wherein the at least two drawing stations comprises a trailing drawing station on a first side of all of the one or more precursor supplies and a leading drawing station on a second side of all of the one or more precursor supplies.

19. The apparatus of claim 1 , wherein the pressure of the gas between the substrate surface and the precursor injector head is in a range from 0.01

Assignees

• Maas Diederik Jan
• Van Someren Bob
• Lexmond Axel Sebastiaan
• Spee Carolus Ida Maria Antonius
• Duisterwinkel Antonie Ellert
• Vermeer Adrianus Johannes Petrus Maria
• TNO

Inventors

• Maas Diederik Jan
• Van Someren Bob
• Lexmond Axel Sebastiaan
• Spee Carolus Ida Maria Antonius
• Duisterwinkel Antonie Ellert
• Vermeer Adrianus Johannes Petrus Maria

Classifications

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C23C16/545

  for coating elongated substrates · CPC title

• C23C16/45519

  Inert gas curtains · CPC title

• C23C16/54

  Apparatus specially adapted for continuous coating · CPC title

• C23C16/45551 Primary

  for relative movement of the substrate and the gas injectors or half-reaction reactor compartments · CPC title