Continuous patterned layer deposition

Patent metadata

Field	Value
Publication number	US-9416449-B2
Application number	US-201113579429-A
Country	US
Kind code	B2
Filing date	Feb 17, 2011
Priority date	Feb 18, 2010
Publication date	Aug 16, 2016
Grant date	Aug 16, 2016

Abstract

A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising
applying bearing gas from the processing head to keep the processing head hovering over the substrate on a gas bearing; moving the substrate and the hovering processing head relative to each other; applying a primer material for selective deposition of a deposition material to the substrate, the primer material being applied from a first area of a surface of the processing head that faces the substrate, and spatially patterning the primer on the substrate after or during application; applying the deposition material to the substrate from a second area of the surface of the processing head that faces the substrate, the second area lying downstream of the first area in a direction of the movement of the substrate relative to the processing head.

First claim

The invention claimed is:

1. A device for manufacturing a substrate with a patterned layer of deposited material, the device comprising
a processing head having a gas bearing surface;
a transport mechanism configured for providing relative movement between a substrate and the processing head, by causing a position on the substrate to be exposed successively to a first, a second, and a third area of the processing head;
wherein the first area includes a first area recess or a first area set of openings coupled to a primer material supply input for applying primer material to the substrate;
wherein the second area includes a pattern writer;
wherein the third area includes a third area recess or third area set of openings coupled to a deposition material supply input for applying deposition material to the substrate;
wherein the pattern writer is configured to spatially pattern the primer material on the substrate, after the primer material is applied to the substrate when exposed to the first area, and before the deposition material is applied to the substrate, when successively exposed to the third area.

2. A device according to claim 1 , wherein the pattern writer is an optical pattern writer comprising a light source configured to provide, from the second area of the processing head, an exposure pattern onto the primer material.

3. The device of claim 2 , wherein the optical pattern writer comprises a laser beam scanner, a laser modulator, and a control circuit configured to provide, from the second area of the processing head, the exposure pattern onto the primer material.

4. The device of claim 2 , wherein the optical pattern writer comprises an array of LEDs and a control circuit configured to provide, from the second area of the processing head, the exposure pattern onto the primer material.

5. A device according to claim 1 , wherein the processing head comprises a fourth area, including a fourth area recess, or a fourth area set of openings coupled to a further deposition material supply input for applying further deposition material to the substrate, the further fourth area recess positioned downstream of the third area, according to a direction of the relative movement imparted by the transport mechanism.

6. A device according to claim 5 , wherein the processing head further comprises a plasma source located in or coupled to a fifth area recess in the gas bearing surface, the fifth area recess positioned downstream of the fourth area, according to a direction of the relative movement provided by the transport mechanism.

7. The device of claim 6 , wherein the fifth area recess comprises electrodes or a coil for generating a radio frequency electromagnetic field and coupled to the plasma source.

8. A device according to claim 1 , wherein the processing head further comprises suction openings disposed along at least one edge of the third area of the gas bearing surface.

9. The device of claim 8 , wherein the processing head further comprises suction openings disposed along at least one edge of the first area of the gas bearing surface or along at least one edge of the second area of the gas bearing surface.

10. A device according to claim 1 , wherein the transport mechanism comprises a first and second roll, for rolling off and on the substrate respectively, the processing head being located along a substrate transport path from the first roll to the second roll.

11. A device according to claim 1 , wherein the first area includes the first area recess and the third area includes the third area recess, the primer material supply input and the deposition material supply input being coupled to the first and third area recesses respectively.

12. A device for manufacturing a substrate with a patterned layer of deposited material, the device comprising
a processing head having a gas bearing surface including first and second areas;
a transport mechanism configured for providing relative movement between a substrate and the processing head, by causing a position on the substrate to be exposed successively to the first and the second areas;
wherein the first area includes a first area recess coupled to a primer material supply input for applying primer material to the substrate;
wherein the second area includes a second area recess or second area set of openings coupled to a deposition material supply input for applying deposition material to the substrate;
the processing head further comprising a printing head that is disposed within the first area recess of the processing head and configured to receive primer material through the primer material supply input, the printing head further configured to spatially pattern the primer material on the substrate, when the primer material is applied to the position of the substrate exposed to the first area and before the deposition material is applied to the position of the substrate, when successively exposed to the second area.

13. The device of claim 12 , wherein the printing head is used in an inkjet printer contained within the first area recess.

14. The device of claim 12 , wherein the printing head comprises a patterned printing roll configured to receive primer material from a bath supplied from the primer material supply input.

15. The device of claim 12 , wherein the processing head comprises a third area, including a third area recess, or a third area set of openings coupled to a further deposition material supply input for applying further deposition material to the substrate, the third area recess positioned downstream of the second area, according to a direction of the relative movement imparted by the transport mechanism.

16. The device of claim 15 , wherein the processing head comprises a fourth area, including a fourth area recess coupled to a plasma input for forming an etching plasma, the fourth area recess positioned downstream of the third area, according to a direction of the relative movement imparted by the transport mechanism.

17. The device of claim 12 , wherein the processing head further comprises suction openings disposed along at least one edge of the second area of the gas bearing surface.

18. The device of claim 17 , wherein the processing head further comprises suction openings disposed along at least one edge of the first area of the gas bearing surface.

19. The device of claim 12 , wherein the transport mechanism comprises first and second rotatable rolls, configured to provide the relative movement between the substrate and the processing head.

20. The device of claim 12 , wherein the transport mechanism comprises a conveyor belt, configured to provide the relative movement between the substrate and the processing head.

Assignees

• De Graaf Ariël
• Van Zwet Erwin John
• Poodt Paulus Willibrordus George
• Vermeer Adrianus Johannes Petrus Maria
• Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Inventors

• De Graaf Ariël
• Van Zwet Erwin John
• Poodt Paulus Willibrordus George
• Vermeer Adrianus Johannes Petrus Maria

Classifications

• C23C16/545

  for coating elongated substrates · CPC title

• C23C16/04

  Coating on selected surface areas, e.g. using masks · CPC title

• C23C16/45551 Primary

  for relative movement of the substrate and the gas injectors or half-reaction reactor compartments · CPC title