Silicon precursors for silicon nitride deposition
US-11996286-B2 · May 28, 2024 · US
Apparatus specially adapted for continuous coating
Apparatus specially adapted for continuous coating · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/54 |
| Official title | Apparatus specially adapted for continuous coating |
| Display label | Apparatus specially adapted for continuous coating |
| Total patents | 1,244 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 89 |
| 2016 | 71 |
| 2017 | 87 |
| 2018 | 92 |
| 2019 | 102 |
| 2020 | 124 |
| 2021 | 110 |
| 2022 | 148 |
| 2023 | 127 |
| 2024 | 143 |
| 2025 | 119 |
| 2026 | 32 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Liner and barrier applications for subtractive metal integration
US-2015380272-A1 · Dec 31, 2015 · US
Chamber design for semiconductor processing
US-2015380217-A1 · Dec 31, 2015 · US
Indexed gas jet injector for substrate processing system
US-2015376793-A1 · Dec 31, 2015 · US
Display apparatus manufacturing apparatus
US-2015368790-A1 · Dec 24, 2015 · US
Ultrathin Multilayer Metal Alloy Liner for Nano Cu Interconnects
US-2015357236-A1 · Dec 10, 2015 · US
In-line type film forming apparatus and method for manufacturing magnetic recording medium
US-9196284-B2 · Nov 24, 2015 · US
Single ald cycle thickness control in multi-station substrate deposition systems
US-2015332912-A1 · Nov 19, 2015 · US
Substrate Processing Apparatus
US-2015315702-A1 · Nov 5, 2015 · US
Systems and methods for forming semiconductor devices
US-9177791-B2 · Nov 3, 2015 · US
Tiled showerhead for a semiconductor chemical vapor deposition reactor
US-9175393-B1 · Nov 3, 2015 · US
ALD process window combinatorial screening tool
US-9175389-B2 · Nov 3, 2015 · US
Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
US-9169561-B2 · Oct 27, 2015 · US
Display apparatus manufacturing method
US-9153795-B2 · Oct 6, 2015 · US
Substrate processing apparatus, method of processing substrate, and method of manufacturing semiconductor device
US-2015279712-A1 · Oct 1, 2015 · US
Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range
US-2015275363-A1 · Oct 1, 2015 · US
Load lock chamber with slit valve doors
US-9145611-B2 · Sep 29, 2015 · US
Plasma CVD apparatus
US-9133547-B2 · Sep 15, 2015 · US
Reactor clean
US-9127364-B2 · Sep 8, 2015 · US
Concentric showerhead for vapor deposition
US-9121096-B2 · Sep 1, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/54?
- CPC C23C16/54 is the Cooperative Patent Classification code for “Apparatus specially adapted for continuous coating.”
- How many patents are filed under CPC C23C16/54 (Apparatus specially adapted for continuous coating)?
- Our database includes 1,244 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/54 growing?
- Publication counts under this code: 143 in 2024 vs 119 in 2025 (latest complete years).