Floating substrate monitoring and control device, and method for the same

Patent metadata

Field	Value
Publication number	US-9478449-B2
Application number	US-201214232901-A
Country	US
Kind code	B2
Filing date	Jul 13, 2012
Priority date	Jul 14, 2011
Publication date	Oct 25, 2016
Grant date	Oct 25, 2016

Abstract

Disclosed is a process tunnel ( 102 ) through which substrates ( 140 ) may be transported in a floating condition between two gas bearings ( 124, 134 ). To monitor the transport of the substrates through the process tunnel, the upper and lower walls ( 120, 130 ) of the tunnel are fitted with at least one substrate detection sensor (S 1 , . . . , S 6 ) at a respective substrate detection sensor location, said substrate detection sensor being configured to generate a reference signal reflecting a presence of a substrate between said first and second walls near and/or at said substrate detection sensor location. Also provided is a monitoring and control unit ( 160 ) that is operably connected to the at least one substrate detection sensor (S 1 , . . . , S 6 ), and that is configured to record said reference signal as a function of time and to process said reference signal.

First claim

The invention claimed is:

1. An apparatus, comprising:
a process tunnel, extending in a longitudinal direction and bounded by at least a first and a second wall, said walls being mutually parallel and spaced apart so as to allow a substantially flat substrate, oriented parallel to the walls, to be accommodated there between, and
a plurality of gas injection channels, provided in both the first and the second walls, wherein the gas injection channels in the first wall are configured to provide for a first gas bearing, while the gas injection channels in the second wall are configured to provide for a second gas bearing, said gas bearings being configured to floatingly support and accommodate said substrate there between,
characterized in that
the first and/or second walls of the process tunnel are fitted with at least one substrate detection sensor at a respective substrate detection sensor location, said substrate detection sensor being configured to generate a reference signal reflecting a presence of a substrate between said first and second walls near and/or at said substrate detection sensor location, wherein the at least one substrate detection sensor includes a pressure sensor configured to register a gas pressure of the first and/or second gas bearing; and
in that the apparatus further comprises:
a monitoring and control unit that is operably connected to the at least one substrate detection sensor, and that is configured to record said reference signal as a function of time and to process said reference signal.

2. The apparatus according to claim 1 , wherein the at least one substrate detection sensor further includes two substrate detection sensors whose respective substrate detection sensor locations are spaced apart along the longitudinal direction of the process tunnel.

3. The apparatus according to claim 1 , wherein the process tunnel is further bounded by two lateral walls that interconnect the first and second walls, wherein each of said lateral walls defines a plurality of longitudinally spaced apart gas exhaust channels, and
wherein the at least one substrate detection sensor further includes two optical sensors whose respective substrate detection sensor locations are adjacent a said lateral wall of the process tunnel, and spaced apart along the longitudinal direction thereof.

4. The apparatus according to claim 1 , wherein the at least one substrate detection sensor further includes two substrate detection sensors whose respective substrate detection sensor locations are spaced apart along the lateral direction of the process tunnel.

5. The apparatus according to claim 1 , wherein the monitoring and control unit includes a display on which it is configured to show information encoded in the reference signal of the at least one substrate detection sensor for inspection by an operator.

6. The apparatus according to claim 1 , wherein the monitoring and control unit is configured to determine at least one longitudinal and/or lateral position-related property of at least one substrate.

7. The apparatus according to claim 6 , wherein the monitoring and control unit is configured to use the reference signals of multiple substrate detection sensors in order to determine the at least one longitudinal and/or lateral position-related property.

8. The apparatus according to claim 6 , wherein the at least one longitudinal and/or lateral position-related property to be determined by the control unit includes one of:
a longitudinal position of a substrate as a function of time;
a longitudinal velocity of a substrate; and
a longitudinal distance between a substrate and another substrate present in the process tunnel.

9. The apparatus according to claim 6 , wherein the at least one longitudinal and/or lateral position-related property to be determined by the control unit includes one of:
a lateral-translational aberration of a substrate; and
a rotational aberration of the substrate.

10. The apparatus according to claim 6 , wherein the at least one longitudinal and/or lateral position-related property to be determined by the monitoring and control unit includes: an approximate circumferential shape of a substantially flat substrate.

11. The apparatus according to claim 6 , wherein the monitoring and control unit is configured to determine for said at least one longitudinal and/or lateral position-related property whether or not it is inside a predetermined, property-specific tolerance range.

12. The apparatus according to claim 11 , wherein the monitoring and control unit is configured to initiate corrective action when it detects that said at least one longitudinal and/or lateral position-related property is not inside said predetermined, property-specific tolerance range, wherein said corrective action includes adapting operating parameters of the apparatus so as to bring said property back inside the tolerance range.

13. A method, comprising:
providing a process tunnel, extending in a longitudinal direction and bounded by at least a first and a second wall, said walls being mutually parallel and spaced apart so as to allow a substantially flat substrate, oriented parallel to the walls, to be accommodated there between;
providing a first gas bearing by providing flowing gas alongside the first wall, and providing a second gas bearing by providing flowing gas alongside the second wall;
successively introducing a plurality of substrates in between the first wall and the second wall, such that each substrate is floatingly accommodated between the first and second gas bearings, and
moving said substrates in succession along the longitudinal direction of the process tunnel;
characterized in that the method further comprises:
repeatedly registering whether a substrate is present between the first and second tunnel walls near and/or at least one substrate detection location in said process tunnel using at least one substrate detection sensor, thereby recording at least one reference signal reflecting a presence of a substrate between said first and second walls near and/or at said at least one substrate detection location as a function of time, wherein the at least one substrate detection sensor includes a pressure sensor configured to register a gas pressure of the first and/or second gas bearing; and
processing said at least one recorded reference signal.

14. The method according to claim 13 , wherein the at least one recorded reference signal reflects the presence of multiple, different substrates of said plurality of substrates at said at least one substrate detection location at different times.

15. The method according to claim 13 , wherein processing the at least one recorded reference signal includes displaying information encoded in said reference signal on a display for inspection by an operator.

16. The method according to claim 15 , wherein the information being displayed includes an amplitude-versus-time graph of said reference signal from said substrate detection location, said graph being suitable for revealing interactions between the substrates of said plurality of substrates near and/or at the respective substrate detection location in said process tunnel.

17. The method according to claim 13 , wherein processing the at least one recorded reference signal includes determining at least one longitudinal and/or lateral position-related property of at least one substrate of said plurality of substrates.

18. The method according to claim 17 , wherein the determination of the at least one longitudinal and/or lateral position-related pr

Assignees

• Vermont Pascal Gustaaf
• Van Velzen Wilhelmus Gerardus
• Kuznetsov Vladimir Ivanovich
• Granneman Ernst Hendrik August
• Ramirez Troxler Gonzalo Felipe
• Asm Int Nv

Inventors

• Vermont Pascal Gustaaf
• Van Velzen Wilhelmus Gerardus
• Kuznetsov Vladimir Ivanovich
• Granneman Ernst Hendrik August
• Ramirez Troxler Gonzalo Felipe

Classifications

• H10P74/238

  comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement · CPC title

• H10P72/3314

  Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers · CPC title

• H10P72/0606

  Position monitoring, e.g. misposition detection or presence detection · CPC title

• H10P72/36

  using air tracks · CPC title

• H10P72/0612 Primary

  Production flow monitoring, e.g. for increasing throughput · CPC title