Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition

Patent metadata

Field	Value
Publication number	US-11453940-B2
Application number	US-202017013535-A
Country	US
Kind code	B2
Filing date	Sep 4, 2020
Priority date	Jul 17, 2015
Publication date	Sep 27, 2022
Grant date	Sep 27, 2022

Abstract

A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.

First claim

The invention claimed is:

1. A vapor deposition metal mask comprising a mask portion composed of a nickel-containing metal sheet, wherein
the mask portion includes
an obverse surface including an obverse surface opening, and
a reverse surface including a reverse surface opening in communication with the obverse surface opening, the reverse surface being opposite to the obverse surface,

at least one of the obverse surface or the reverse surface is a target surface,
the target surface has a surface roughness Sa of less than or equal to 0.019 μm,
the target surface has a surface roughness Sz of less than or equal to 0.308 μm,
the nickel-containing metal sheet is made of invar, and has a thickness of between 2 μm and 40 μm inclusive, and
a specular reflectance of incident light to the target surface is between 53.0% and 97.0%, inclusive.

2. The vapor deposition metal mask according to claim 1 , wherein
two directions that are perpendicular to each other in the target surface are directions in which light is incident as viewed facing the target surface, and
a difference in the reflectance between the two directions is less than or equal to 3.6%.

3. The vapor deposition metal mask according to claim 1 , wherein
the target surface includes at least the obverse surface, and
the obverse surface opening is an opening for passage of vapor deposition particles from the obverse surface opening toward the reverse surface opening and is larger than the reverse surface opening.

4. The vapor deposition metal mask according to claim 1 , wherein the nickel-containing metal sheet has an elongated shape.

5. The vapor deposition metal mask according to claim 1 , wherein the nickel-containing metal sheet is rolled in a one-dimensional direction.

6. The vapor deposition metal mask according to claim 1 , wherein the nickel-containing metal sheet includes granular aluminum oxide or magnesium oxide.

7. The vapor deposition metal mask according to claim 1 , wherein the nickel-containing metal sheet does not include granular aluminum oxide and magnesium oxide.

8. A method for manufacturing a vapor deposition metal mask according to claim 1 , the method comprising:
forming a nickel-containing metal sheet on an electrode surface by electrolysis; and
separating the nickel-containing metal sheet from the electrode surface, wherein
the nickel-containing metal sheet includes an obverse surface and a reverse surface, which is opposite to the obverse surface,
at least one of the obverse surface or the reverse surface is a target surface for placing a resist layer,
the electrolysis causes the target surface to have a surface roughness Sa of less than or equal to 0.019 μm and causes the target surface to have a surface roughness Sz of less than or equal to 0.308 μm,
the electrolysis further causes the nickel-containing metal sheet to have a thickness of between 2 μm and 40 μm, inclusive, and causes the nickel-containing metal sheet to have a specular reflectance of incident light to the target surface is between 53.0% and 97.0%, inclusive.

9. A method for manufacturing a vapor deposition metal mask according to claim 1 , the method comprising:
forming a resist mask on a target surface of a vapor deposition metal mask substrate; and
etching the target surface by wet etching using the resist mask.

Assignees

• Toppan Printing Co Ltd

Inventors

• Tamura Sumika
• Shinno Mikio
• Fujito Daisei
• Nishitsuji Kiyoaki
• Nishi Takehiro
• Mikami Naoko

Classifications

• C25B11/055

  characterised by the substrate or carrier material · CPC title

• C25D1/10

  Moulds; Masks; Masterforms · CPC title

• C25C1/08

  of nickel or cobalt · CPC title

• C25D1/04

  Wires; Strips; Foils · CPC title

• C23F1/02

  Local etching · CPC title