Charged particle beam apparatus

Patent metadata

Field	Value
Publication number	US-11398366-B2
Application number	US-202016927932-A
Country	US
Kind code	B2
Filing date	Jul 13, 2020
Priority date	Aug 8, 2019
Publication date	Jul 26, 2022
Grant date	Jul 26, 2022

Abstract

A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.

First claim

What is claimed is:

1. A charged particle beam apparatus comprising:
a database configured to store a to-be-used-in-calculation device model for use in estimation of a circuit of a sample or correction sample and an optical condition under which a charged particle beam is applied to the sample or the correction sample;
a charged particle beam optical system comprising a lens barrel mounted on a sample chamber and operatively coupled with a controller configured to control the charged particle beam applied to the sample or the correction sample under the optical condition;
a detector configured to detect secondary electrons emitted from the sample or the correction sample excited by the application of the charged particle beam and output a detection signal based on the secondary electrons; and
a computer configured to generate a to-be-used-in-computation netlist on a basis of the to-be-used-in-calculation device model corresponding to the correction sample, estimate, on a basis of the to-be-used-in-computation netlist and the optical condition, a first application result when the charged particle beam is applied to the correction sample under the optical condition, compare the first application result with a second application result based on the detection signal when the charged particle beam is applied to the correction sample under the optical condition, and correct the optical condition when the first application result and the second application result differ from each other.

2. The charged particle beam apparatus according to claim 1 , wherein the computer is further configured to correct the optical condition by changing a condition of each of items of the optical condition within a predetermined range in accordance with the comparison result between the first application result and the second application result.

3. The charged particle beam apparatus according to claim 1 , wherein the computer is further configured to predetermine a changeable item from among the items of the optical condition, and correct the optical condition by changing only a condition of the changeable item.

4. The charged particle beam apparatus according to claim 1 , wherein
the correction sample includes a plurality of elements, and
the computer is further configured to correct the optical condition on a basis of the first application result and the second application result for each of the plurality of elements.

5. The charged particle beam apparatus according to claim 1 , wherein the computer is further configured to correct a plurality of the optical conditions.

6. The charged particle beam apparatus according to claim 1 , wherein the computer is further configured to store, when the first application result and the second application result coincide with each other, the optical condition after correction in the database with the optical condition after correction associated with the optical condition before correction stored in the database.

7. The charged particle beam apparatus according to claim 6 , wherein the computer is further configured to compare the optical condition before correction and the optical condition after correction to calculate an optical condition correction coefficient for each of the items, and store the optical condition correction coefficient in the database with the optical condition correction coefficient associated with the optical condition before correction.

8. The charged particle beam apparatus according to claim 1 , wherein the to-be-used-in-calculation device model includes a model representing a defect in a device.

9. The charged particle beam apparatus according to claim 1 , wherein the to-be-used-in-calculation device model includes any one of a model defining a circuit of a device, a mathematical expression defining electrical characteristics of the device, a shape of the device, or physical properties of the device.

10. The charged particle beam apparatus according to claim 9 , wherein the to-be-used-in-calculation device model includes a parameter value of a circuit element included in the circuit of the device.

11. The charged particle beam apparatus according to claim 1 , wherein
the database stores a pulse conversion condition under which the charged particle beam is pulsed,
the charged particle beam optical system controls the charged particle beam applied to the sample under the optical condition and the pulse conversion condition, and
the computer is further configured to estimate the first application result on a basis of the optical condition and the pulse conversion condition.

12. The charged particle beam apparatus according to claim 1 , wherein
the correction sample is an external sample for which a circuit has been estimated by another of the charged particle beam apparatus, and
the database stores the to-be-used-in-calculation device model corresponding to the external sample.

13. The charged particle beam apparatus according to claim 1 , wherein the computer compares, after correcting the optical condition, the first application result and a third application result when the charged particle beam is applied to the correction sample under the optical condition, and updates, when the first application result and the third application result differ from each other, the to-be-used-in-calculation device corresponding to the correction sample.

14. The charged particle beam apparatus according to claim 13 , wherein the computer is further configured to change a parameter value included in the to-be-used-in-calculation device model corresponding to the correction sample, and update the to-be-used-in-computation netlist using the parameter value changed.

Assignees

• Hitachi High Tech Corp

Inventors

• Miwa Takafumi
• Nakamura Yohei
• Tsuno Natsuki
• KIMIZUKA Heita
• Fukuda Muneyuki

Classifications

• H01J37/153 Primary

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title

• H01J2237/2482

  Optical means · CPC title

• G01N2223/07

  secondary emission · CPC title

• G01N2223/507

  secondary-emission detector · CPC title

• H01J37/22 Primary

  Optical {, image processing} or photographic arrangements associated with the tube · CPC title