Target debris collection device and extreme ultraviolet light source apparatus including the same

Patent metadata

Field	Value
Publication number	US-11231656-B2
Application number	US-202016835708-A
Country	US
Kind code	B2
Filing date	Mar 31, 2020
Priority date	Aug 23, 2019
Publication date	Jan 25, 2022
Grant date	Jan 25, 2022

Abstract

A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

First claim

What is claimed is:

1. An extreme ultraviolet light source apparatus, comprising:
a collector included in a vessel, the collector configured to reflect extreme ultraviolet light;
a baffle assembly included in the vessel, the baffle assembly configured to allow the extreme ultraviolet light reflected from the collector to pass through an internal transmissive region of the baffle assembly, the baffle assembly including a baffle body and a discharge plate, the discharge plate provided in a first end portion of the baffle body adjacent to the collector, the discharge plate configured to collect the target material debris within the baffle body;
a guide structure configured to guide target material debris collected in the baffle assembly to a collection tank; and
a first heating member and a second heating member, the first heating member provided in the guide structure, the second heating member provided in the discharge plate, the first and second heating members configured to heat the target material debris.

2. The extreme ultraviolet light source apparatus of claim 1 , wherein the first heating member comprises at least one heating line which extends from the baffle assembly to the collection tank, and the at least one heating line is included in the guide structure.

3. The extreme ultraviolet light source apparatus of claim 1 , wherein the guide structure has a length between 100 mm to 300 mm.

4. The extreme ultraviolet light source apparatus of claim 1 , wherein the guide structure extends along a direction of gravity.

5. The extreme ultraviolet light source apparatus of claim 1 , wherein the guide structure comprises a guide plate which extends from the baffle assembly to the collection tank.

6. The extreme ultraviolet light source apparatus of claim 1 , wherein
the baffle body is between the collector and an outlet port of the vessel.

7. The extreme ultraviolet light source apparatus of claim 1 , further comprising:
a discharge nozzle installed in a discharge hole formed in the discharge plate, the discharge nozzle configured to be connected to the guide structure.

8. The extreme ultraviolet light source apparatus of claim 7 , further comprising:
a third heating member included in the discharge nozzle, the third heating member configured to heat the target material debris.

9. An extreme ultraviolet light source apparatus, comprising:
a collector included in a vessel, the collector configured to reflect extreme ultraviolet light; and
a target debris collection device configured to collect target material debris within the vessel,
the target debris collection device comprises,
a baffle body between the collector and an outlet port of the vessel, the baffle body configured to allow the extreme ultraviolet light reflected from the collector to pass through an internal transmissive region of the baffle body,
a discharge plate provided in a first end portion of the baffle body adjacent to the collector, the discharge plate configured to collect the target material debris within the baffle body,
a guide structure configured to guide the target material debris collected in the discharge plate to a collection tank, the guide structure having a length between 100 mm and 300 mm,
a first heating member provided in the guide structure, the first heating member configured to heat the target material debris, and
a second heating member provided in the discharge plate, the second heating member configured to heat the target material debris.

10. The extreme ultraviolet light source apparatus of claim 9 , wherein the first heating member comprises at least one heating line which extends from the discharge plate to the collection tank.

11. The extreme ultraviolet light source apparatus of claim 9 , wherein the guide structure extends along a direction of gravity.

12. The extreme ultraviolet light source apparatus of claim 9 , wherein the guide structure comprises a guide plate which extends from the discharge plate to the collection tank.

13. The extreme ultraviolet light source apparatus of claim 9 , wherein the target debris collection device further comprises a discharge nozzle installed in a discharge hole formed in the discharge plate, the discharge nozzle configured to be connected to the guide structure.

14. The extreme ultraviolet light source apparatus of claim 9 , wherein the discharge plate has an annular shape extending along the first end portion of the baffle body.

15. The extreme ultraviolet light source apparatus of claim 9 , further comprising:
a purge gas supply portion configured to supply a purge gas into the collector.

16. A target debris collection device for extreme ultraviolet light source apparatus, comprising:
a baffle body extending within an extreme ultraviolet (EUV) vessel between a collector and an outlet port of the EUV vessel, the baffle body configured to allow extreme ultraviolet light reflected from the collector to pass through an internal transmissive region of the baffle body;
a discharge plate provided in a first end portion of the baffle body adjacent to the collector, the discharge plate configured to collect target material debris on an inner surface of the baffle body;
a guide structure configured to guide the target material debris collected in the discharge plate to a collection tank;
a first heating member provided in the guide structure, the first heating member configured to heat the target material debris; and
a second heating member provided in the discharge plate, the second heating member configured to heat the target material debris.

17. The target debris collection device for extreme ultraviolet light source apparatus of claim 16 , further comprising:
a plurality of vanes extending from the baffle body on an inner wall of the baffle body.

18. The target debris collection device for extreme ultraviolet light source apparatus of claim 16 , wherein the first heating member comprises at least one heating line which extends from the discharge plate to the collection tank.

19. The target debris collection device for extreme ultraviolet light source apparatus of claim 16 , wherein the guide structure comprises a guide plate which extends from the discharge plate to the collection tank.

20. The target debris collection device for extreme ultraviolet light source apparatus of claim 16 , further comprising:
a discharge nozzle installed in a discharge hole formed in the discharge plate, the discharge nozzle configured to be connected to the guide structure.

Assignees

• Samsung Electronics Co Ltd

Inventors

• KIM SungHyup
• Yu Ho
• Kim Jeonggil
• Choi Minseok

Classifications

• H05G2/0025

  Systems for collecting the plasma generating material after the plasma generation · CPC title

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70916 Primary

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title

• G03F7/2008

  characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used · CPC title

• G03F7/70925

  Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning · CPC title