Removing photoresist from a wafer
US-2017357158-A1 · Dec 14, 2017 · US
characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/2008 |
| Official title | {characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used} |
| Display label | characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used |
| Total patents | 304 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 18 |
| 2016 | 34 |
| 2017 | 28 |
| 2018 | 34 |
| 2019 | 39 |
| 2020 | 45 |
| 2021 | 28 |
| 2022 | 23 |
| 2023 | 21 |
| 2024 | 17 |
| 2025 | 14 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for fine line manufacturing
US-2017336710-A1 · Nov 23, 2017 · US
Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US-9795023-B2 · Oct 17, 2017 · US
Photomask and method for manufacturing semiconductor device using the same
US-2017236707-A1 · Aug 17, 2017 · US
Phase shift mask and method of forming patterns using the same
US-2017192348-A1 · Jul 6, 2017 · US
Wet strippable gap fill materials
US-9671694-B1 · Jun 6, 2017 · US
Phase shift mask and method of forming patterns using the same
US-9632438-B2 · Apr 25, 2017 · US
Method of manufacturing a structure on a substrate
US-2017090289-A1 · Mar 30, 2017 · US
Extreme ultraviolet lithography process
US-2016377983-A1 · Dec 29, 2016 · US
Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US-9529263-B2 · Dec 27, 2016 · US
Rotary euv collector
US-2016370705-A1 · Dec 22, 2016 · US
Method of patterning thin films
US-2016363865-A1 · Dec 15, 2016 · US
Reflective mask blank for euv lithography
US-2016357100-A1 · Dec 8, 2016 · US
Method for manufacturing color filter, color filter, and display device
US-2016349611-A1 · Dec 1, 2016 · US
Exposure apparatus and exposure method
US-9500955-B2 · Nov 22, 2016 · US
Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
US-9465294-B2 · Oct 11, 2016 · US
Halftone phase shift mask blank and halftone phase shift mask
US-2016291452-A1 · Oct 6, 2016 · US
Projection objective for a microlithographic projection exposure apparatus
US-2016282729-A1 · Sep 29, 2016 · US
Extreme ultraviolet lithography process
US-9442387-B2 · Sep 13, 2016 · US
Exposure machine
US-9436100-B2 · Sep 6, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/2008?
- CPC G03F7/2008 is the Cooperative Patent Classification code for “characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used.”
- How many patents are filed under CPC G03F7/2008 (characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used)?
- Our database includes 304 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/2008 growing?
- Publication counts under this code: 17 in 2024 vs 14 in 2025 (latest complete years).