Euv light source and apparatus for lithography

Patent metadata

Field	Value
Publication number	US-2020004167-A1
Application number	US-201916415642-A
Country	US
Kind code	A1
Filing date	May 17, 2019
Priority date	Jun 28, 2018
Publication date	Jan 2, 2020
Grant date	—

Abstract

An extreme ultraviolet (EUV) radiation source apparatus includes a collector and a target droplet generator for generating a tin (Sn) droplet. A debris collection device is disposed over a reflection surface of the collector, and at least one drip hole is located between the debris collection device and the collector. A tin bucket for collecting debris from the debris collection device is located below the at least one drip hole, and a tube or guide rod extends from the drip hole to the tin bucket.

First claim

What is claimed is:

1 . An extreme ultraviolet (EUV) radiation source apparatus, comprising:
a collector; a target droplet generator for generating a tin (Sn) droplet; a debris collection device disposed over a reflection surface of the collector; at least one drip hole located between the debris collection device and the collector; a tin bucket for collecting debris from the debris collection device located below the at least one drip hole; and a tube or guide rod extending from the drip hole to the tin bucket.

2 . The EUV radiation source apparatus of claim 1 , further comprising a heater connected to the tube or guide rod.

3 . The EUV radiation source apparatus of claim 2 , wherein the heater further comprises a heater controller to control heating of the tube or guide rod.

4 . The EUV radiation source apparatus of claim 2 , wherein the heater comprises heating tape wrapped around the tube.

5 . The EUV radiation source apparatus of claim 2 , wherein the tube is clad and a portion of the heater is embedded in cladding surrounding the tube.

6 . The EUV radiation source apparatus of claim 2 , wherein the guide rod includes a hollow portion and the heater includes a heating element located in the hollow portion of the guide rod.

7 . The EUV radiation source apparatus of claim 1 , wherein the tube or guide rod comprises a thermally conductive metal.

8 . The EUV radiation source apparatus of claim 7 , wherein the thermally conductive metal is selected from the group consisting of aluminum, brass, nickel, steel, tungsten, and zinc.

9 . The EUV radiation source apparatus of claim 1 , comprising:
a plurality of drip holes located below a lower circumference of the debris collection device; a plurality of tin buckets, wherein each tin bucket is located below at least one of the drip holes; and a plurality of tubes or guide rods, wherein each tube or guide rod extends from one of the drip holes to one of the tin buckets.

10 . The EUV radiation source apparatus of claim 9 , comprising a plurality of heaters, wherein each heater is connected to one of the tubes or guide rods.

11 . An extreme ultraviolet (EUV) radiation source apparatus, comprising:
an ellipsoidal EUV reflector; a target droplet generator; a frustoconical-shaped debris collection mechanism disposed over the ellipsoidal EUV reflector, wherein the frustoconical-shaped debris collection mechanism comprises a plurality of vanes extending between an upper annular-shaped support frame and a lower annular-shaped support frame; a fluid passage located below the plurality of vanes; a receptacle located below the fluid passage; and a tube or rod extending from the fluid passage to the receptacle.

12 . The EUV radiation source apparatus of claim 11 , further comprising a heater connected to the tube or rod.

13 . The EUV radiation source apparatus of claim 12 , wherein the heater further comprises a heater controller to control heating of the tube or rod.

14 . The EUV radiation source apparatus of claim 12 , wherein the heater comprises heating tape wrapped around the tube.

15 . The EUV radiation source apparatus of claim 12 , wherein the rod includes a hollow portion and the heater includes a heating element located in the hollow portion of the rod.

16 . A method for generating an extreme ultraviolet (EUV) radiation, comprising:
irradiating a tin droplet with laser light in an EUV radiation source apparatus, thereby creating the EUV radiation and tin debris; and heating a tube or guide rod between a drip hole and a tin bucket, thereby causing tin debris deposited about the drip hole to flow.

17 . The method according to claim 16 , wherein the heating the tube or guide rod comprises applying electrical resistance heating using a heating element connected to the tube or guide rod.

18 . The method according to claim 17 , wherein the heating element is a heating tape wrapped around the tube.

19 . The method according to claim 17 , wherein the guide rod includes a hollow portion and the heating element is located in the hollow portion.

20 . The method according to claim 17 , further comprising controlling the heating a tube or guide rod using a heater controller connected to the heating element.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chen Yu-Chih
• Yu Sheng-Kang
• Yang Chi
• Chien Shang-Chieh
• Chen Li-Jui
• Cheng Po-Chung

Classifications

• G03F7/2004 Primary

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70916 Primary

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title

• G03F7/70175

  Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source · CPC title

• H05G2/005

  Electricity · mapped topic