Substrate processing apparatus, substrate processing method, and storage medium

Patent metadata

Field	Value
Publication number	US-10923368-B2
Application number	US-201816164919-A
Country	US
Kind code	B2
Filing date	Oct 19, 2018
Priority date	Oct 20, 2017
Publication date	Feb 16, 2021
Grant date	Feb 16, 2021

Abstract

A substrate processing apparatus according to an embodiment includes a substrate processing tank, a temperature adjustment unit, and a controller. The substrate processing tank is configured to perform an etching processing by immersing a substrate in a phosphoric acid processing liquid therein. The temperature adjustment unit is configured to adjust the temperature of the phosphoric acid processing liquid. The controller is configured to control the temperature adjustment unit to lower the temperature of the phosphoric acid processing liquid as the etching processing proceeds.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a substrate processing tank configured to etch a substrate by immersing the substrate in a phosphoric acid processing liquid and including a first circulation line configured to circulate the phosphoric acid processing liquid in the substrate processing tank;
a temperature control tank configured to receive the phosphoric acid processing liquid from a phosphoric acid aqueous solution supply and supply a reserve liquid to the substrate processing tank, the temperature control tank including a second circulation line, the second circulation line being configured to circulate the reserve liquid in the temperature control tank;
a temperature adjuster configured to adjust a temperature of the phosphoric acid processing liquid, the temperature adjuster including a first heater positioned in the first circulation line and a second heater positioned in the second circulation line; and
a controller configured to control the temperature adjuster to adjust the temperature of the phosphoric acid processing liquid in the substrate processing tank such that the substrate is etched with the phosphoric acid processing liquid having a pre-set initial temperature when starting to immerse the substrate in the phosphoric acid processing liquid, and subsequently as the substrate is being etched, adjusting the temperature of the phosphoric acid processing liquid to become lower than the pre-set initial temperature.

2. The substrate processing apparatus of claim 1 , wherein the controller is configured to control the temperature adjuster to raise the temperature of the phosphoric acid processing liquid after lowering the temperature of the phosphoric acid processing liquid to a predetermined temperature.

3. The substrate processing apparatus of claim 1 , further comprising:
a phosphoric acid concentration adjuster configured to adjust a phosphoric acid concentration in the phosphoric acid processing liquid,
wherein the controller is configured to control the phosphoric acid concentration adjuster to lower the phosphoric acid concentration as the etching processing proceeds.

4. The substrate processing apparatus of claim 3 , wherein the controller is configured to control the phosphoric acid concentration adjuster to increase the phosphoric acid concentration after lowering the phosphoric acid concentration of the phosphoric acid processing liquid to a predetermined phosphoric acid concentration.

5. The substrate processing apparatus of claim 1 , further comprising:
a silicon concentration adjuster configured to adjust a silicon concentration in the phosphoric acid processing liquid,
wherein the controller is configured to control the silicon concentration adjuster to lower the silicon concentration as the etching processing proceeds.

6. The substrate processing apparatus of claim 5 , wherein the controller is configured to control the silicon concentration adjuster to increase the silicon concentration after lowering the silicon concentration of the phosphoric acid processing liquid to a predetermined silicon concentration.

7. The substrate processing apparatus of claim 1 , wherein the temperature adjuster further includes a flow rate regulator.

8. The substrate processing apparatus of claim 7 , wherein the flow rate regulator is configured to adjust a supply of pure water from a pure water source to the substrate processing tank.

9. The substrate processing apparatus of claim 7 , wherein the flow rate regulator is configured to adjust a supply of the reserve liquid from the temperature control tank to the substrate processing tank.

10. The substrate processing apparatus of claim 7 , wherein the first heater is configured to control a temperature of the phosphoric acid processing liquid supplied to an inner tank of the substrate processing tank from an outer tank of the substrate processing tank.

11. The substrate processing apparatus of claim 7 , wherein the second heater is configured to control a temperature of the reserve liquid supplied to an outer tank of the substrate processing tank from the temperature control tank.

12. A substrate processing method comprising:
first adjusting a temperature of a phosphoric acid processing liquid to a pre-set initial temperature;
immersing a substrate in the phosphoric acid processing liquid contained in a substrate processing tank at the pre-set initial temperature such that the substrate is etched; and
second adjusting the temperature of the phosphoric acid processing liquid to a temperature lower than the pre-set initial temperature via a temperature adjuster after the immersing as the substrate is being etched,
wherein the temperature adjuster includes a first heater positioned in a first circulation line, the first circulation line being configured to circulate the phosphoric acid processing liquid in the substrate processing tank and a second heater positioned in a second circulation line, the second circulation line being configured to circulate a reserve fluid in a temperature control tank separate from the substrate processing tank, the temperature control tank being configured to supply the reserve fluid to the substrate processing tank and to receive phosphoric acid processing liquid from the phosphoric acid aqueous solution supply.

13. A non-transitory computer-readable storage medium that stores a program for causing a computer to execute the substrate processing method of claim 12 .

Assignees

• Tokyo Electron Ltd

Inventors

• Inada Takao
• Kawano Hisashi
• Ohno Hiroki

Classifications

• H10P74/238

  comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P50/283

  by chemical means · CPC title