Thermally stable volatile precursors

Patent metadata

Field	Value
Publication number	US-9982344-B2
Application number	US-201615215153-A
Country	US
Kind code	B2
Filing date	Jul 20, 2016
Priority date	Aug 24, 2010
Publication date	May 29, 2018
Grant date	May 29, 2018

Abstract

A method of forming a thin film on a substrate which includes a step of contacting a surface with a precursor compound having a transition metal and one or more alkyl-1,3-diazabutadiene ligands is provided. The resulting modified surface is then contacted with an activating compound.

First claim

What is claimed is:

1. A method for depositing a film on a surface of a substrate, the method comprising:
a) reacting a vapor of a metal-containing compound described by formula I with an activating compound to form a film on the surface of the substrate by a chemical vapor deposition process:

wherein:
M is Fe(II), Co(II), or Ni(II);
n is a formal charge of M;
m is an integer;
o is an integer such that an overall formal charge of the a metal-containing compound described by formula I is 0;
p is a formal charge of the ligand within brackets;
R 1 is hydrogen, C 1 -C 12 alkyl, amine, or C 6 -C 18 aryl; and
R 2 is hydrogen, C 1 -C 10 alkyl, C 6 -C 18 aryl, amino, C 1 -C 12 alkylamino, or C 2 -C 24 dialkylamino.

2. The method of claim 1 wherein the activating compound is a reducing agent selected from the group consisting of molecular hydrogen, atomic hydrogen, silane, disilane, organosilanes, compounds containing Si—H bonds, germane, organogermanes, compounds containing Ge—H bonds, stannane, compounds containing Sn—H bonds, other metal hydride compounds, formic acid, glyoxalic acid, oxalic acid, other carboxylic acids, diborane, compounds containing B—H bonds, hydrazine, carbon-substituted hydrazines, formalin, formaldehyde, organic alcohols, organoaluminum compounds, organozinc compounds, and plasma-activated versions thereof.

3. The method of claim 1 wherein the activating compound is an oxidizing agent and the film is a metal oxide.

4. The method of claim 1 wherein the activating compound is a nitrogen-containing agent and the film is a metal nitride.

5. The method of claim 1 wherein the metal-containing compound described by formula I is thermally activated.

6. The method of claim 1 wherein the metal-containing compound described by formula I is plasma activated.

7. The method of claim 1 wherein R 1 and R 2 are each independently hydrogen or C 1 -C 4 alkyl.

8. The method of claim 1 wherein M is Fe(II), Co(II), or Ni(II).

9. The method of claim 1 wherein M is Co(II).

10. The method of claim 1 wherein the film is a metal.

Assignees

• Univ Wayne State

Inventors

• Winter Charles H
• Knisley Thomas J

Classifications

• C07F15/065 Primary

  without a metal-carbon linkage · CPC title

• C23C16/45527 Primary

  characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title

• C07F13/005

  Compounds without a metal-carbon linkage · CPC title

• C07F15/025

  without a metal-carbon linkage · CPC title

• C07F11/005

  compounds without a metal-carbon linkage · CPC title