Thermally stable volatile precursors

Patent metadata

Field	Value
Publication number	US-9822446-B2
Application number	US-201615017105-A
Country	US
Kind code	B2
Filing date	Feb 5, 2016
Priority date	Aug 24, 2010
Publication date	Nov 21, 2017
Grant date	Nov 21, 2017

Abstract

A method of forming a thin film on a substrate which includes a step of contacting a surface with a precursor compound having a transition metal and one or more alkyl-1,3-diazabutadiene ligands is provided. The resulting modified surface is then contacted with an activating compound.

First claim

What is claimed is:

1. A metal-containing compound being having formula II:

wherein:
M is Co(II);
R 1 is C 3 alkyl; and
R 2 is hydrogen or C 1 -C 10 alkyl.

2. The metal-containing compound of claim 1 wherein R 2 is hydrogen or C 1 -C 4 alkyl.

3. The metal-containing compound of claim 1 wherein R 2 is hydrogen.

4. The metal-containing compound of claim 1 wherein R 2 is hydrogen, methyl, ethyl, propyl, n-butyl, sec-butyl, isobutyl, or t-butyl.

5. The metal-containing compound of claim 1 wherein R 1 is propyl.

Assignees

• Univ Wayne State

Inventors

• Winter Charles H
• Knisley Thomas J

Classifications

• C07F15/045

  without a metal-carbon linkage · CPC title

• C07F11/005

  compounds without a metal-carbon linkage · CPC title

• C07F15/025

  without a metal-carbon linkage · CPC title

• C23C16/45527 Primary

  characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title

• C07F15/065 Primary

  without a metal-carbon linkage · CPC title