Fingerprint sensor and manufacturing method thereof
US-9984947-B2 · May 29, 2018 · US
US10672676B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10672676-B2 |
| Application number | US-201815988940-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 24, 2018 |
| Priority date | Jun 4, 2015 |
| Publication date | Jun 2, 2020 |
| Grant date | Jun 2, 2020 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A fingerprint sensor device and a method of making a fingerprint sensor device. As non-limiting examples, various aspects of this disclosure provide various fingerprint sensor devices, and methods of manufacturing thereof, that comprise an interconnection structure, for example a bond wire, at least a portion of which extends into a dielectric layer utilized to mount a plate, and/or that comprise an interconnection structure that extends upward from the semiconductor die at a location that is laterally offset from the plate.
Opening claim text (preview).
What is claimed is: 1. A sensor device comprising: a substrate having a top substrate side, a bottom substrate side, and lateral substrate sides between the top and bottom substrate sides, the substrate comprising a conductive layer on the top substrate side; a semiconductor die having a top die side, a bottom die side coupled to the top substrate side, and lateral die sides between the top and bottom die sides, the semiconductor die comprising a sensing area on the top die side and a conductive pad on the top die side; a conductive interconnection structure electrically connecting the conductive pad of the semiconductor die to the conductive layer of the substrate; a dielectric layer (DL) having a top DL side, a bottom DL side coupled to the top die side, and lateral DL sides between the top and bottom DL sides; and a plate positioned over the sensing area of the semiconductor die, the plate having a top plate side, a bottom plate side coupled to the top DL side, and lateral plate sides between the top and bottom plate sides, wherein the center of the plate is laterally offset from the center of the sensing area of the semiconductor die. 2. The sensor device of claim 1 , wherein the dielectric layer comprises an adhesive layer that adheres the bottom plate side to the top die side. 3. The sensor device of claim 1 , wherein the dielectric layer is transparent. 4. The sensor device of claim 1 , wherein the dielectric layer completely covers the sensing area of the semiconductor die. 5. The sensor device of claim 1 , wherein the dielectric layer covers a smaller area than the semiconductor die. 6. The sensor device of claim 1 , wherein the dielectric layer comprises an aperture. 7. The sensor device of claim 1 , wherein the sensing area of the semiconductor die is centered on the top die side. 8. The sensor device of claim 1 , wherein the bottom DL side contacts the top die side. 9. The sensor device of claim 1 , wherein the sensing area of the semiconductor die comprises sensing elements that sense fingerprint characteristics. 10. A sensor device comprising: a substrate having a top substrate side, a bottom substrate side, and lateral substrate sides between the top and bottom substrate sides, the substrate comprising a conductive layer on the top substrate side; a semiconductor die having a top die side, a bottom die side coupled to the top substrate side, and lateral die sides between the top and bottom die sides, the semiconductor die comprising a sensing area on the top die side and a conductive pad on the top die side; a conductive interconnection structure electrically connecting the conductive pad of the semiconductor die to the conductive layer of the substrate; a plate positioned over the sensing area of the semiconductor die, the plate having a top plate side, a bottom plate side, and lateral plate sides between the top and bottom plate sides, wherein the center of the plate is laterally offset from the center of the sensing area of the semiconductor die; and an encapsulating material covering at least the top substrate side, the lateral die sides, and the conductive interconnection structure. 11. The sensor device of claim 10 , wherein the conductive interconnection structure comprises a bond wire, and the encapsulating material contacts and surrounds the entire bond wire. 12. The sensor device of claim 10 , wherein the encapsulating material covers the lateral plate sides. 13. The sensor device of claim 12 , wherein the encapsulating material contacts the lateral die sides and the lateral plate sides. 14. The sensor device of claim 10 , wherein the encapsulating material comprises a top surface that is higher than the top plate side, and the encapsulating material comprises an aperture that exposes at least a portion of the top plate side from the encapsulating material. 15. The sensor device of claim 14 , wherein the encapsulating material covers a peripheral portion of the top plate side. 16. The sensor device of claim 10 , comprising an adhesive layer that couples the bottom die side to the top substrate side, and wherein the encapsulating material laterally surrounds the adhesive layer, the semiconductor die, and the plate. 17. A method of manufacturing a sensor device, the method comprising: receiving a structure comprising: a substrate having a top substrate side, a bottom substrate side, and lateral substrate sides between the top and bottom substrate sides, the substrate comprising a conductive layer on the top substrate side; a semiconductor die having a top die side, a bottom die side coupled to the top substrate side, and lateral die sides between the top and bottom die sides, the semiconductor die comprising a sensing area on the top die side and a conductive pad on the top die side; and a conductive interconnection structure electrically connecting the conductive pad of the semiconductor die to the conductive layer of the substrate; forming a dielectric layer (DL) having a top DL side, a bottom DL side coupled to the top die side, and lateral DL sides between the top and bottom DL sides; and mounting a plate positioned over the sensing area of the semiconductor die, the plate having a top plate side, a bottom plate side coupled to the top DL side, and lateral plate sides between the top and bottom plate sides, wherein the center of the mounted plate is laterally offset from the center of the sensing area of the semiconductor die. 18. The method of claim 17 , comprising forming an encapsulating material covering at least the top substrate side, the lateral die sides, lateral sides of the dielectric layer, and the conductive interconnection structure. 19. The method of claim 17 , wherein the bottom DL side contacts the top die side. 20. The method of claim 17 , wherein the encapsulating material comprises a top surface that is higher than the top plate side, and the encapsulating material comprises an aperture that exposes at least a portion of the top plate side from the encapsulating material.
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.