Self-aligned slotted accumulation-mode field effect transistor (ACCUFET) structure and method

Patent metadata

Field	Value
Publication number	US-10468526-B2
Application number	US-201715836756-A
Country	US
Kind code	B2
Filing date	Dec 8, 2017
Priority date	Mar 2, 2008
Publication date	Nov 5, 2019
Grant date	Nov 5, 2019

Abstract

This invention discloses a semiconductor power device disposed in a semiconductor substrate. The semiconductor power device includes trenched gates each having a stick-up gate segment extended above a top surface of the semiconductor substrate surrounded by sidewall spacers. The semiconductor power device further includes slots opened aligned with the sidewall spacers substantially parallel to the trenched gates. The stick-up gate segment further includes a cap composed of an insulation material surrounded by the sidewall spacers. A layer of barrier metal covers a top surface of the cap and over the sidewall spacers and extends above a top surface of the slots. The slots are filled with a gate material same as the gate segment for functioning as additional gate electrodes for providing a depletion layer extends toward the trenched gates whereby a drift region between the slots and the trenched gate is fully depleted at a gate-to-drain voltage Vgs=0 volt.

First claim

We claim:

1. An accumulation mode field effect transistor (AccuFET) comprising:
trenched gates each having a stick-up gate segment extended above a top surface of a semiconductor substrate surrounded by sidewall spacers;
slots opened aligned with the sidewall spacers substantially parallel to the trenched gates; and
sidewalls of the slots are doped with dopant ions of opposite conductivity from that of a drain and a top of the slots and the sidewalls of the slots covered by a barrier metal layer with the slots without filling.

2. The AccuFET power device of claim 1 wherein:
the barrier metal layer is composed of a Schottky metal layer.

3. An accumulation mode field effect transistor (AccuFET) disposed on an epitaxial layer overlaying a semiconductor substrate comprising:
a trench gate with a gate polysilicon filled in a first trench extending into the epitaxial layer to a first depth;
a source region surrounding a top portion of the trench gate disposed onto a top of the epitaxial layer to a second depth shallower than the first depth; and
a second trench next to the source region away from the first trench vertically extend into the epitaxial layer to a third depth deeper than the second depth and shallower than the first depth, whereas the second trench is an open slot with sidewalls lined with a barrier metal layer and with the open slot without filling.

4. The accumulation mode field effect transistor of claim 3 wherein:
the barrier metal layer is a Schottky barrier metal layer.

5. The accumulation mode field effect transistor of claim 3 wherein:
the gate polysilicon filled in the trench further having a stick-up gate segment extended above a top surface of the semiconductor substrate and surrounded by sidewall spacers.

6. The accumulation mode field effect transistor of claim 5 wherein:
the second trench is aligned with the sidewall spacers and substantially parallel to the trench gate.

7. The accumulation mode field effect transistor of claim 3 wherein:
the sidewalls of the second trench are doped with dopant ions of opposite conductivity from that of a drain of the AccuFET.

8. The accumulation mode field effect transistor of claim 5 wherein:
the stickup gate segment is further covered by a silicon nitride cap disposed above a top of the gate polysilicon.

9. The accumulation mode field effect transistor of claim 5 wherein:
the barrier metal layer further extends laterally to cover a top surface of the source region.

Assignees

• Hebert Francois
• Bobde Madhur
• Bhalla Anup
• Alpha & Omega Semiconductor

Inventors

• Hébert François
• Bobde Madhur
• Bhalla Anup

Classifications

• H10P30/222

  characterised by the angle between the ion beam and the crystal planes or the main crystal surface (characterised by the angle between the ion beam and the mask H10P30/221) · CPC title

• H01L29/7806

  Electricity · mapped topic

• H01L29/0623

  Electricity · mapped topic

• H01L29/7828 Primary

  Electricity · mapped topic

• H01L29/0847

  Electricity · mapped topic