Semiconductor device

US9502402B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9502402-B2
Application numberUS-201314047720-A
CountryUS
Kind codeB2
Filing dateOct 7, 2013
Priority dateMar 23, 2009
Publication dateNov 22, 2016
Grant dateNov 22, 2016

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device includes: a semiconductor layer having a first end portion and a second end portion; a first main electrode provided on the first end portion and electrically connected to the semiconductor layer; a second main electrode provided on the second end portion and electrically connected to the semiconductor layer; a first gate electrode provided via a first gate insulating film in a plurality of first trenches formed from the first end portion toward the second end portion; and a second gate electrode provided via a second gate insulating film in a plurality of second trenches formed from the second end portion toward the first end portion. Spacing between a plurality of the first gate electrodes and spacing between a plurality of the second gate electrodes are 200 nm or less.

First claim

Opening claim text (preview).

The invention claimed is: 1. A semiconductor device comprising: a semiconductor layer including: an N-type base layer; a first P-type base layer on a first side of the N-type base layer; a second P-type base layer on a second side of the N-type base layer, the N-type base layer being between the first and second P-type base layers in a first direction; a plurality of first gate electrodes provided on a first insulating film on the first side of the N-type base layer, the…

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Frequently asked questions

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What does patent US9502402B2 cover?
A semiconductor device includes: a semiconductor layer having a first end portion and a second end portion; a first main electrode provided on the first end portion and electrically connected to the semiconductor layer; a second main electrode provided on the second end portion and electrically connected to the semiconductor layer; a first gate electrode provided via a first gate insulating fil…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification H10D62/111. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).