Use of quartz plates during growth of single crystal silicon ingots
US-12146236-B2 · Nov 19, 2024 · US
US10227709B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10227709-B2 |
| Application number | US-201514623760-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 17, 2015 |
| Priority date | Nov 24, 2010 |
| Publication date | Mar 12, 2019 |
| Grant date | Mar 12, 2019 |
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A method of growing a rare-earth oxyorthosilicate crystal, and crystals grown using the method are disclosed. The method includes preparing a melt by melting a first substance including at least one first rare-earth element and providing an atmosphere that includes an inert gas and a gas including oxygen.
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What is claimed is: 1. A method of growing a rare-earth oxyorthosilicate crystal, comprising: preparing a melt by melting a first substance comprising at least one first rare-earth element; and melting at least one of: a substance comprising a group 2 element, a substance comprising a group 3 element; a substance comprising a group 6 element, and a substance comprising a group 7 element; providing a surface of the melt with an atmosphere comprising an inert gas and an oxygen-containing compound that disassociates to oxygen; where the oxygen-containing compound is selected from carbon dioxide, carbon monoxide, sulfur trioxide, phosphorus pentoxide, NO 2 , N 2 O, NO, N 2 O 3 , N 2 O 5 , or a combination thereof; and where the oxygen derived from the disassociation of the oxygen-containing compound is present in the atmosphere in an amount of at least 100 parts per million but less than 300 parts per million; contacting the surface of the melt with a seed crystal; and growing a colorless oxyorthosilicate single crystal from the melt by withdrawing the seed crystal from the melt. 2. The method of claim 1 , wherein the inert gas has a thermal conductivity less than or equal to 150 mW/m-° K at the temperature used during crystal growth. 3. The method of claim 1 , wherein the inert gas comprises at least one of helium, argon, krypton, or xenon. 4. The method of claim 1 , wherein the inert gas comprises nitrogen. 5. The method of claim 1 , wherein preparing a melt further comprises melting a second substance comprising a second rare-earth element, the second rare-earth element being incorporated into the rare-earth oxyorthosilicate crystal as a dopant. 6. The method of claim 5 , wherein the second rare-earth element is cerium. 7. The method of claim 1 , wherein the first rare-earth element is lutetium, and growing an oxyorthosilicate single crystal comprises growing a lutetium oxyorthosilicate single crystal. 8. A method of making a single crystalline oxyorthosilicate scintillator material, the material comprising: preparing a starting material comprising a rare-earth element, a codopant comprising at least one of a group 2 element, a group 3 element; where the group 3 element is scandium, a group 6 element and a group 7 element, an activator, silicon and oxygen; and forming a colorless single crystal of an oxyorthosilicate of the first rare-earth element and doped with the activator from the starting material in an atmosphere comprising an inert gas and an oxygen-containing compound that disassociates to oxygen; where the oxygen-containing compound is selected from carbon dioxide, carbon monoxide, sulfur trioxide, phosphorus pentoxide, NO 2 , N 2 O, NO, N 2 O 3 , N 2 O 5 , or a combination thereof; and where the oxygen derived from the disassociation of the oxygen-containing compound is present in the atmosphere in an amount of at least 100 parts per million but less than 300 parts per million. 9. The method of claim 8 , wherein preparing a starting material comprises making melt of the starting material, and wherein forming a single comprises growing a single crystal from the melt. 10. The method of claim 8 , wherein the rare-earth element comprises lutetium and the activator is cerium.
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