Process for growing silicon carbide single crystal and device for the same

US9359690B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9359690-B2
Application numberUS-201113880562-A
CountryUS
Kind codeB2
Filing dateOct 17, 2011
Priority dateOct 21, 2010
Publication dateJun 7, 2016
Grant dateJun 7, 2016

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is a method for manufacturing a silicon carbide single crystal using a solution process including coming a seed crystal substrate for growing silicon carbide into contact with a Si—C alloy solution including at least one additive metal and growing the silicon carbide single crystal on a seed crystal for growing silicon carbide, including feeding a silicon feedstock into an alloy solution when a molar ratio of Si and the additive metal is lower than an initially set value as the reaction progresses. The method increases a crystal growth speed, maintains the growth speed, and prevents the growth from unwillingly stopping when the silicon carbide single crystal is manufactured using a solution growth process.

First claim

Opening claim text (preview).

The invention claimed is: 1. A device for manufacturing a silicon carbide single crystal using a solution growth process, which includes a crucible receiving a Si-C alloy solution in a growth furnace and a seed crystal fixed shaft including a seed crystal substrate for growing silicon carbide in a growth furnace, comprising: a silicon feed unit feeding a silicon feedstock into the crucible, wherein the silicon feed unit includes a feed tube having a tube shape formed through at least a portion of the seed crystal fixed shaft. 2. The device of claim 1 , wherein the silicon feed unit includes a gas supply tube supplying an atmospheric gas.

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What does patent US9359690B2 cover?
Provided is a method for manufacturing a silicon carbide single crystal using a solution process including coming a seed crystal substrate for growing silicon carbide into contact with a Si—C alloy solution including at least one additive metal and growing the silicon carbide single crystal on a seed crystal for growing silicon carbide, including feeding a silicon feedstock into an alloy soluti…
Who is the assignee on this patent?
Hong Sung Wan, Kim Young Shol, Sk Innovation Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B15/002. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).