Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same
US-12518963-B2 · Jan 6, 2026 · US
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Yang Byeong-Il patents
Yang Byeong-Il is listed as an inventor on 27 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Yang Byeong-Il |
| Total patents | 27 |
| First publication | May 5, 2016 |
| Latest publication | Jan 6, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Silicon precursor compound in asymmetric structure, method for preparing the same, and method for preparing a silicon-containing thin film
US-2025230176-A1 · Jul 17, 2025 · US
Silicon precursor compound and preparation method therefor, and silicon-containing thin film preparation method using silicon precursor
US-2025051914-A1 · Feb 13, 2025 · US
Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same
US-11749522-B2 · Sep 5, 2023 · US
Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same
US-2023089296-A1 · Mar 23, 2023 · US
Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same
US-11390635-B2 · Jul 19, 2022 · US
Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same
US-11393676-B2 · Jul 19, 2022 · US
Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
US-11358974-B2 · Jun 14, 2022 · US
Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon containing thin film using the same
US-2022139704-A1 · May 5, 2022 · US
Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same
US-11319333-B2 · May 3, 2022 · US
Recent patents
Latest publications not already listed above.
Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same
US-2021147451-A1 · May 20, 2021 · US
Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same
US-10894799-B2 · Jan 19, 2021 · US
Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
US-2020392294-A1 · Dec 17, 2020 · US
Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same
US-2020361966-A1 · Nov 19, 2020 · US
Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same
US-2020131205-A1 · Apr 30, 2020 · US
Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same
US-2020111665-A1 · Apr 9, 2020 · US
Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same
US-2020111664-A1 · Apr 9, 2020 · US
Method for manufacturing silicon nitride thin film using plasma atomic layer deposition
US-2019249296-A1 · Aug 15, 2019 · US
Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same
US-10202407-B2 · Feb 12, 2019 · US
Method for manufacturing silicon nitride thin film using plasma atomic layer deposition method
US-2018230591-A1 · Aug 16, 2018 · US
Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition
US-9916974-B2 · Mar 13, 2018 · US
Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
US-9809608-B2 · Nov 7, 2017 · US
NOVEL AMINO-SILYL AMINE COMPOUND AND THE MANUFACTURING METHOD OF DIELECTRIC FILM CONTAINING Si-N BOND BY USING ATOMIC LAYER DEPOSITION
US-2017125243-A1 · May 4, 2017 · US
Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
US-9586979-B2 · Mar 7, 2017 · US
Novel trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same
US-2016333030-A1 · Nov 17, 2016 · US
Novel cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
US-2016326193-A1 · Nov 10, 2016 · US
Novel amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
US-2016122369-A1 · May 5, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Dnf Co Ltd | 27 |
| Merck Patent Gmbh | 2 |
| M Chemicals Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/45553 | 25 |
| C07F7/10 | 24 |
| C23C16/345 | 21 |
| C23C16/45536 | 20 |
| H10P14/6339 | 19 |