Inductively coupled plasma chamber with electrically powered magnet ring
US-2026066241-A1 · Mar 5, 2026 · US
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Willwerth Michael D patents
Willwerth Michael D is listed as an inventor on 65 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Willwerth Michael D |
| Total patents | 65 |
| First publication | Jun 30, 2015 |
| Latest publication | Mar 5, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Capacitive sensing data integration for plasma chamber condition monitoring
US-12537179-B2 · Jan 27, 2026 · US
Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring
US-2026011539-A1 · Jan 8, 2026 · US
Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring
US-12437979-B2 · Oct 7, 2025 · US
Spatial optical emission spectroscopy for etch uniformity
US-12405164-B2 · Sep 2, 2025 · US
Capacitive sensor housing for chamber condition monitoring
US-12163911-B2 · Dec 10, 2024 · US
Gas distribution plate with UV blocker
US-12130561-B2 · Oct 29, 2024 · US
Sensors and system for in-situ edge ring erosion monitor
US-2024321610-A1 · Sep 26, 2024 · US
Fast gas exchange apparatus, system, and method
US-12068135-B2 · Aug 20, 2024 · US
Sensors and system for in-situ edge ring erosion monitor
US-12009236-B2 · Jun 11, 2024 · US
Recent patents
Latest publications not already listed above.
Capacitive sensing data integration for plasma chamber condition monitoring
US-2023343568-A2 · Oct 26, 2023 · US
Spatial optical emission spectroscopy for etch uniformity
US-2023258500-A1 · Aug 17, 2023 · US
Spatial optical emission spectroscopy for etch uniformity
US-11668602-B2 · Jun 6, 2023 · US
Gas distribution plate with uv blocker
US-2023102933-A1 · Mar 30, 2023 · US
Capacitive sensing data integration for plasma chamber condition monitoring
US-2023103165-A1 · Mar 30, 2023 · US
Capacitive sensor for chamber condition monitoring
US-11581206-B2 · Feb 14, 2023 · US
Resonant process monitor
US-11551905-B2 · Jan 10, 2023 · US
Capacitive sensing data integration for plasma chamber condition monitoring
US-11545346-B2 · Jan 3, 2023 · US
Capacitive sensor housing for chamber condition monitoring
US-2022341867-A1 · Oct 27, 2022 · US
Spatial optical emission spectroscopy for etch uniformity
US-2022333989-A1 · Oct 20, 2022 · US
Gas distribution plate with UV blocker at the center
US-11448977-B1 · Sep 20, 2022 · US
Fast gas exchange apparatus, system, and method
US-2022262600-A1 · Aug 18, 2022 · US
Capacitive sensor housing for chamber condition monitoring
US-11415538-B2 · Aug 16, 2022 · US
Conductive wafer lift pin o-ring gripper with resistor
US-11387135-B2 · Jul 12, 2022 · US
Ring for substrate extreme edge protection
US-2022157574-A1 · May 19, 2022 · US
Chamber lid with integrated heater
US-11264252-B2 · Mar 1, 2022 · US
Substrate support pedestal
US-D931240-S · Sep 21, 2021 · US
Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring
US-2021280399-A1 · Sep 9, 2021 · US
Capacitive sensing data integration for plasma chamber condition monitoring
US-2021280400-A1 · Sep 9, 2021 · US
Capacitive sensor housing for chamber condition monitoring
US-2021278360-A1 · Sep 9, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 65 |
| Willwerth Michael D | 3 |
| Palagashvili David | 2 |
| Intel Corp | 1 |
| Matyushkin Alexander | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32935 | 16 |
| H10P72/72 | 15 |
| H01L21/6831 | 12 |
| H01J37/32642 | 12 |
| H01J2237/334 | 11 |