Chamber lid with integrated heater

US11264252B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11264252-B2
Application numberUS-201916561907-A
CountryUS
Kind codeB2
Filing dateSep 5, 2019
Priority dateOct 12, 2018
Publication dateMar 1, 2022
Grant dateMar 1, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.

First claim

Opening claim text (preview).

What is claimed is: 1. A chamber lid assembly, comprising: a dielectric plate configured to seal a processing chamber; and a heater disposed within the dielectric plate, wherein the heater has one or more heating zones that are independently controlled, and wherein the heater comprises a plurality of radially oriented spokes, at least a portion of the radially oriented spokes being joined by a first arc segment at an outer diameter position and a second arc segment at an inner diameter position. 2. The lid assembly of claim 1 , wherein the dielectric plate comprises a ceramic material. 3. The lid assembly of claim 1 , wherein the one or more heating zones comprises an inner zone and an outer zone. 4. The lid assembly of claim 1 , wherein the dielectric plate is laminated. 5. The lid assembly of claim 1 , wherein the heater is coupled to a terminal assembly. 6. The lid assembly of claim 5 , wherein the terminal assembly is positioned on a peripheral edge of the dielectric plate. 7. The lid assembly of claim 1 , wherein the heater includes an inner trace and an outer trace. 8. The lid assembly of claim 7 , wherein the inner trace and the outer trace include a plurality of arc segments. 9. The lid assembly of claim 8 , wherein each of the plurality of arc segments are joined to the radially oriented spokes. 10. A processing chamber, comprising: a chamber body; a substrate support assembly disposed in the chamber body; and a lid assembly, the lid assembly comprising: a dielectric plate configured to seal the processing chamber; and a heater disposed within the dielectric plate, wherein the heater comprises a plurality of radially oriented spokes, at least a portion of which are joined by a first arc segment at an outer diameter position and a second arc segment at an inner diameter position, and wherein the heater has one or more heating zones that are independently controlled. 11. The chamber of claim 10 , wherein the one or more heating zones comprises an inner zone and an outer zone. 12. The chamber of claim 10 , wherein the dielectric plate is laminated. 13. The chamber of claim 10 , wherein the heater is coupled to a terminal assembly. 14. The chamber of claim 13 , wherein the terminal assembly is positioned on a peripheral edge of the dielectric plate. 15. The chamber of claim 10 , wherein the heater includes an inner trace and an outer trace. 16. The chamber of claim 15 , wherein the inner trace and the outer trace include a plurality of arc segments. 17. The chamber of claim 16 , wherein a portion of the plurality of arc segments are joined to the radially oriented spokes. 18. A processing chamber, comprising: a chamber body; a substrate support assembly disposed in the chamber body; and a lid assembly, the lid assembly comprising: a dielectric plate configured to seal the processing chamber a heater disposed within the dielectric plate; and an electromagnetic shield embedded in the dielectric plate adjacent to the heater, wherein the heater comprises a plurality of radially oriented spokes, and wherein the heater has one or more heating zones that are independently controlled. 19. The processing chamber of claim 18 , wherein the electromagnetic shield is above the heater. 20. The processing chamber of claim 18 , wherein the electromagnetic shield comprises a shape that substantially matches a shape of the heater in plan view.

Assignees

Inventors

Classifications

  • for etching · CPC title

  • characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

  • mainly by conduction · CPC title

  • Temperature · CPC title

  • characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11264252B2 cover?
Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0418. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).