Electrostatic chuck with radio frequency isolated heaters
US-2018213608-A1 · Jul 26, 2018 · US
US11264252B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11264252-B2 |
| Application number | US-201916561907-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 5, 2019 |
| Priority date | Oct 12, 2018 |
| Publication date | Mar 1, 2022 |
| Grant date | Mar 1, 2022 |
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Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.
Opening claim text (preview).
What is claimed is: 1. A chamber lid assembly, comprising: a dielectric plate configured to seal a processing chamber; and a heater disposed within the dielectric plate, wherein the heater has one or more heating zones that are independently controlled, and wherein the heater comprises a plurality of radially oriented spokes, at least a portion of the radially oriented spokes being joined by a first arc segment at an outer diameter position and a second arc segment at an inner diameter position. 2. The lid assembly of claim 1 , wherein the dielectric plate comprises a ceramic material. 3. The lid assembly of claim 1 , wherein the one or more heating zones comprises an inner zone and an outer zone. 4. The lid assembly of claim 1 , wherein the dielectric plate is laminated. 5. The lid assembly of claim 1 , wherein the heater is coupled to a terminal assembly. 6. The lid assembly of claim 5 , wherein the terminal assembly is positioned on a peripheral edge of the dielectric plate. 7. The lid assembly of claim 1 , wherein the heater includes an inner trace and an outer trace. 8. The lid assembly of claim 7 , wherein the inner trace and the outer trace include a plurality of arc segments. 9. The lid assembly of claim 8 , wherein each of the plurality of arc segments are joined to the radially oriented spokes. 10. A processing chamber, comprising: a chamber body; a substrate support assembly disposed in the chamber body; and a lid assembly, the lid assembly comprising: a dielectric plate configured to seal the processing chamber; and a heater disposed within the dielectric plate, wherein the heater comprises a plurality of radially oriented spokes, at least a portion of which are joined by a first arc segment at an outer diameter position and a second arc segment at an inner diameter position, and wherein the heater has one or more heating zones that are independently controlled. 11. The chamber of claim 10 , wherein the one or more heating zones comprises an inner zone and an outer zone. 12. The chamber of claim 10 , wherein the dielectric plate is laminated. 13. The chamber of claim 10 , wherein the heater is coupled to a terminal assembly. 14. The chamber of claim 13 , wherein the terminal assembly is positioned on a peripheral edge of the dielectric plate. 15. The chamber of claim 10 , wherein the heater includes an inner trace and an outer trace. 16. The chamber of claim 15 , wherein the inner trace and the outer trace include a plurality of arc segments. 17. The chamber of claim 16 , wherein a portion of the plurality of arc segments are joined to the radially oriented spokes. 18. A processing chamber, comprising: a chamber body; a substrate support assembly disposed in the chamber body; and a lid assembly, the lid assembly comprising: a dielectric plate configured to seal the processing chamber a heater disposed within the dielectric plate; and an electromagnetic shield embedded in the dielectric plate adjacent to the heater, wherein the heater comprises a plurality of radially oriented spokes, and wherein the heater has one or more heating zones that are independently controlled. 19. The processing chamber of claim 18 , wherein the electromagnetic shield is above the heater. 20. The processing chamber of claim 18 , wherein the electromagnetic shield comprises a shape that substantially matches a shape of the heater in plan view.
for etching · CPC title
characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title
mainly by conduction · CPC title
Temperature · CPC title
characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title
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