Capacitive sensing data integration for plasma chamber condition monitoring

Patent metadata

Field	Value
Publication number	US-11545346-B2
Application number	US-202016812081-A
Country	US
Kind code	B2
Filing date	Mar 6, 2020
Priority date	Mar 6, 2020
Publication date	Jan 3, 2023
Grant date	Jan 3, 2023

Abstract

Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. In an example, a plasma chamber monitoring system includes a plurality of capacitive sensors, a capacitance digital converter, and an applied process server coupled to the capacitance digital converter, the applied process server including a system software. The capacitance digital converter includes an isolation interface coupled to the plurality of capacitive sensors, a power supply coupled to the isolation interface, a field-programmable gate-array firmware coupled to the isolation interface, and an application-specific integrated circuit coupled to the field-programmable gate-array firmware.

First claim

What is claimed is:

1. A plasma chamber monitoring system, comprising:
a plurality of capacitive sensors;
a capacitance digital converter, comprising:
an isolation interface coupled to the plurality of capacitive sensors;
a power supply coupled to the isolation interface;
a field-programmable gate-array firmware coupled to the isolation interface; and
an application-specific integrated circuit coupled to the field-programmable gate-array firmware; and

an applied process server coupled to the capacitance digital converter, the applied process server comprising a system software.

2. The plasma chamber monitoring system of claim 1 , wherein the application-specific integrated circuit of the capacitance digital converter is an etherCAT application-specific integrated circuit.

3. The plasma chamber monitoring system of claim 2 , wherein the etherCAT application-specific integrated circuit provides for seamless integration of the system software and control of multiple ones of the plurality of capacitive sensors simultaneously.

4. The plasma chamber monitoring system of claim 2 , wherein the etherCAT application-specific integrated circuit initializes and calibrates individual ones of the plurality of capacitive sensors.

5. The plasma chamber monitoring system of claim 1 , wherein the applied process server synchronizes capacitance sensor data from the plurality of capacitive sensors with a process recipe.

6. The plasma chamber monitoring system of claim 1 , wherein the field-programmable gate-array firmware of the capacitance digital converter provides for deterministic timing and simultaneous communication with multiple ones of the plurality of capacitive sensors.

7. The plasma chamber monitoring system of claim 1 , wherein individual ones of the plurality of capacitive sensors are coupled in parallel to the isolation interface of the capacitance digital converter.

8. The plasma chamber monitoring system of claim 7 , wherein individual ones of the plurality of capacitive sensors are each coupled to the isolation interface of the capacitance digital converter by an interconnect comprising an inter-integrated circuit bus and a power supply line.

Assignees

• Applied Materials Inc

Inventors

• Pan Yaoling
• Tae Patrick John
• Willwerth Michael D
• Tedeschi Leonard
• Shang Kiyki-Shiy N
• Taraboukhine Mikhail V
• Hardy Charles R
• Nagarajan Sivasankar

Classifications

• H01J2237/24564

  Measurements of electric or magnetic variables, e.g. voltage, current, frequency · CPC title

• H01J37/32807

  Construction (includes replacing parts of the apparatus) · CPC title

• G01N27/228

  Circuits therefor (measuring capacitance per se G01R27/26) · CPC title

• H01J37/32935 Primary

  Monitoring and controlling tubes by information coming from the object and/or discharge · CPC title

• H01J2237/31705

  Impurity or contaminant control · CPC title