Laser system for source material conditioning in an euv light source
US-2025318038-A1 · Oct 9, 2025 · US
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Rafac Robert Jay patents
Rafac Robert Jay is listed as an inventor on 46 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Rafac Robert Jay |
| Total patents | 46 |
| First publication | Jan 28, 2016 |
| Latest publication | Oct 9, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Laser system for source material conditioning in an EUV light source
US-12369244-B2 · Jul 22, 2025 · US
EUV light source target metrology
US-12238848-B2 · Feb 25, 2025 · US
Laser system for target metrology and alteration in an euv light source
US-2024419083-A1 · Dec 19, 2024 · US
System for monitoring a plasma
US-12171053-B2 · Dec 17, 2024 · US
Laser system for target metrology and alteration in an EUV light source
US-12078934-B2 · Sep 3, 2024 · US
Euv light source target metrology
US-2023300965-A1 · Sep 21, 2023 · US
Determining moving properties of a target in an extreme ultraviolet light source
US-11758639-B2 · Sep 12, 2023 · US
Apparatus for and method of accelerating droplets in a droplet generator for an euv source
US-2023164900-A1 · May 25, 2023 · US
Laser system for source material conditioning in an euv light source
US-2022192000-A1 · Jun 16, 2022 · US
Recent patents
Latest publications not already listed above.
System for monitoring a plasma
US-2022151052-A1 · May 12, 2022 · US
Determining moving properties of a target in an extreme ultraviolet light source
US-2022086998-A1 · Mar 17, 2022 · US
System for monitoring a plasma
US-11266002-B2 · Mar 1, 2022 · US
Laser system for target metrology and alteration in an euv light source
US-2021263422-A1 · Aug 26, 2021 · US
Target expansion rate control in an extreme ultraviolet light source
US-11096266-B2 · Aug 17, 2021 · US
Reducing the effect of plasma on an object in an extreme ultraviolet light source
US-10904993-B2 · Jan 26, 2021 · US
System for monitoring a plasma
US-2020344868-A1 · Oct 29, 2020 · US
Target expansion rate control in an extreme ultraviolet light source
US-2020260564-A1 · Aug 13, 2020 · US
Target expansion rate control in an extreme ultraviolet light source
US-10674591-B2 · Jun 2, 2020 · US
Wavelength-based optical filtering
US-10663866-B2 · May 26, 2020 · US
Extreme ultraviolet light source
US-10667377-B2 · May 26, 2020 · US
Reducing the effect of plasma on an object in an extreme ultraviolet light source
US-2019274210-A1 · Sep 5, 2019 · US
Compensating for a physical effect in an optical system
US-10401704-B2 · Sep 3, 2019 · US
Target expansion rate control in an extreme ultraviolet light source
US-2019254152-A1 · Aug 15, 2019 · US
Reducing the effect of plasma on an object in an extreme ultraviolet light source
US-10349509-B2 · Jul 9, 2019 · US
Target expansion rate control in an extreme ultraviolet light source
US-10314153-B2 · Jun 4, 2019 · US
Reducing the effect of plasma on an object in an extreme ultraviolet light source
US-2018343730-A1 · Nov 29, 2018 · US
Systems and methods for controlling EUV energy generation using pulse intensity
US-9980359-B2 · May 22, 2018 · US
Target expansion rate control in an extreme ultraviolet light source
US-2018139831-A1 · May 17, 2018 · US
Compensating for a physical effect in an optical system
US-2018136541-A1 · May 17, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 44 |
| Cymer LLC | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H05G2/008 | 40 |
| G03F7/70033 | 25 |
| H05G2/0027 | 22 |
| H05G2/0088 | 20 |
| H05G2/0084 | 15 |