Systems and methods for controlling EUV energy generation using pulse intensity

Patent metadata

Field	Value
Publication number	US-9980359-B2
Application number	US-201514824289-A
Country	US
Kind code	B2
Filing date	Aug 12, 2015
Priority date	Aug 12, 2015
Publication date	May 22, 2018
Grant date	May 22, 2018

Abstract

In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.

First claim

What is claimed is:

1. A method comprising:
measuring, by an extreme ultraviolet (EUV) energy detector, an amount of EUV energy generated in a plasma chamber of a laser produced plasma (LPP) EUV system resulting from a first laser pulse having a first pulse width and a first intensity impacting a droplet to create a plasma in the plasma chamber;
comparing, by an EUV controller, the measured amount of EUV energy generated to an expected amount of EUV energy to determine a present stability of the plasma within the plasma chamber; and
instructing, by the EUV controller and based on the determined present stability of the plasma within the plasma chamber, a pulse actuator to modify by a gain factor an intensity of a subsequent laser pulse relative to the first intensity, the subsequent laser pulse also having the first pulse width.

2. The method of claim 1 , further comprising:
measuring, by the EUV energy detector, a subsequent amount of EUV energy generated from the subsequent laser pulse impacting a subsequent droplet to continue creating the plasma in the plasma chamber;
comparing, by the EUV controller, the measured subsequent amount of EUV energy generated to the expected amount of EUV energy to determine a subsequent stability of the plasma within the plasma chamber; and
instructing, by the EUV controller and based on the determined subsequent stability of the plasma within the plasma chamber, the pulse actuator to modify by the gain factor an intensity of a further laser pulse relative to the intensity of the subsequent laser pulse.

3. The method of claim 1 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change an amount of radio frequency (RF) power provided to an acousto-optic modulator (AOM).

4. The method of claim 1 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change a high voltage applied to an electro-optic modulator (EOM) crystal.

5. The method of claim 1 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change a timing of triggering an electro-optic modulator (EOM) relative to a Q-switch acousto-optic modulator (AOM).

6. A laser produced plasma (LPP) extreme ultraviolet (EUV) system, comprising:
an EUV energy detector configured to measure an amount of EUV energy generated in a plasma chamber resulting from a first laser pulse having a first pulse width and a first intensity impacting a droplet to create a plasma in the plasma chamber; and
an EUV controller configured to:
compare the measured amount of EUV energy generated to an expected amount of EUV energy to determine a present stability of the plasma within the plasma chamber, and
instruct, based on the determined present stability of the plasma within the plasma chamber, a pulse actuator to modify by a gain factor an intensity of a subsequent laser pulse relative to the first intensity, the subsequent laser pulse also having the first pulse width.

7. The LPP EUV system of claim 6 , wherein the instruction to modify the intensity of the subsequent laser pulse comprises an instruction instructing the pulse actuator to change an amount of radio frequency (RF) power provided to an acousto-optic modulator (AOM).

8. The LPP EUV system of claim 6 , wherein the instruction to modify the intensity of the subsequent laser pulse comprises an instruction instructing the pulse actuator to change a high voltage applied to an electro-optic modulator (EOM) crystal.

9. The LPP EUV system of claim 6 , wherein the instruction to modify the intensity of the subsequent laser pulse comprises an instruction instructing the pulse actuator to change a timing of triggering an electro-optic modulator (EOM) relative to a Q-switch acousto-optic modulator (AOM).

10. A non-transitory computer-readable medium having instructions embodied thereon, the instructions executable by one or more processors to perform operations comprising:
obtaining, from an extreme ultraviolet (EUV) energy detector, a measured amount of EUV energy generated in a plasma chamber of a laser produced plasma (LPP) EUV system resulting from a first laser pulse having a first pulse width and a first intensity impacting a droplet to create a plasma in the plasma chamber;
comparing the measured amount of EUV energy generated to an expected amount of EUV energy to determine a present stability of the plasma within the plasma chamber; and
instructing, based on the determined present stability of the plasma within the plasma chamber, a pulse actuator to modify by a gain factor an intensity of a subsequent laser pulse relative to the first intensity, the subsequent laser pulse also having the first pulse width.

11. The non-transitory computer-readable medium of claim 10 , wherein the operations further comprise:
obtaining, from the EUV energy detector, a measured subsequent amount of EUV energy generated from the subsequent laser pulse impacting a subsequent droplet to continue creating the plasma in the plasma chamber;
comparing the measured subsequent amount of EUV energy generated to the expected amount of EUV energy to determine a subsequent stability of the plasma within the plasma chamber; and
instructing, based on the determined subsequent stability of the plasma within the plasma chamber, the pulse actuator to modify by the gain factor an intensity of a further laser pulse relative to the intensity of the subsequent laser pulse.

12. The non-transitory computer-readable medium of claim 10 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change an amount of radio frequency (RF) power provided to an acousto-optic modulator (AOM).

13. The non-transitory computer-readable medium of claim 10 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change a high voltage applied to an electro-optic modulator (EOM) crystal.

14. The non-transitory computer-readable medium of claim 10 , wherein instructing the pulse actuator to modify the intensity of the subsequent laser pulse comprises an instruction to change a timing of triggering an electro-optic modulator (EOM) relative to a Q-switch acousto-optic modulator (AOM).

Assignees

• Asml Netherlands Bv

Inventors

• Riggs Daniel Jason
• Rafac Robert Jay

Classifications

• H05G2/003

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/008 Primary

  involving an energy-carrying beam in the process of plasma generation · CPC title

• H05G1/30

  Controlling · CPC title

• H05G2/0084 Primary

  Control of the laser beam · CPC title