Reducing the effect of plasma on an object in an extreme ultraviolet light source

Patent metadata

Field	Value
Publication number	US-10904993-B2
Application number	US-201916418652-A
Country	US
Kind code	B2
Filing date	May 21, 2019
Priority date	Apr 25, 2016
Publication date	Jan 26, 2021
Grant date	Jan 26, 2021

Abstract

A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.

First claim

What is claimed is:

1. A method of providing targets to a target region of an extreme ultraviolet (EUV) light source, the method comprising:
providing a first target to a target region in an interior of a vacuum chamber, the first target comprising target material that emits extreme ultraviolet (EUV) light in a plasma state;
directing a first light beam toward the target region to form a first plasma from the target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target;
providing a second target to the target region in the interior of the vacuum chamber, the second target comprising target material that emits extreme ultraviolet light in a plasma state, wherein the first target and the second target are two targets in a stream targets;
distributing heat in the interior of the vacuum chamber relative to a separate and distinct object in the vacuum chamber by directing a second light beam toward the target region to form a second plasma from the target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the second emission direction being different from the first emission direction, wherein the separate and distinct object in the vacuum chamber is one of a plurality of targets in the stream other than the first target and the second target, and
providing the one of the plurality of targets in the stream other than the first target to the target region in the interior of the vacuum chamber after distributing the heat such that the one of the plurality of targets follows a trajectory that is substantially the same as a trajectory followed by the first target and the second target.

2. The method of claim 1 , wherein:
the target material of the first target is arranged in a first geometric distribution, the first geometric distribution having an extent along an axis oriented at a first angle relative to the separate and distinct object in the vacuum chamber,
the target material of the second target is arranged in a second geometric distribution, the second geometric distribution having an extent along an axis oriented at a second angle relative to the separate and distinct object in the vacuum chamber, the second angle being different from the first angle,
the first emission direction being determined by the position of the first target comprises the first emission direction being determined by the first angle, and
the second emission direction being determined by the position of the second target comprises the second emission direction being determined by the second angle.

3. The method of claim 2 , wherein:
providing a first target to an interior of a vacuum chamber comprises:
providing a first initial target to the interior of the vacuum chamber, the first initial target comprising target material in an initial geometric distribution; and
directing an optical pulse toward the first initial target to form the first target, the geometric distribution of the first target being different from the geometric distribution of the first initial target, and

providing a second target to an interior of a vacuum chamber comprises:
providing a second initial target to the interior of the vacuum chamber, the second initial target comprising target material in a second initial geometric distribution; and
directing an optical pulse toward the second initial target to form the second target, the geometric distribution of the second target being different from the geometric distribution of the second initial target.

4. The method of claim 3 , wherein the first initial target and the second initial target are substantially spherical, and the first target and the second target are disk shaped.

5. The method of claim 2 , further comprising providing a fluid to the interior of the vacuum chamber, the fluid occupying a volume in the vacuum chamber, and wherein the separate and distinct object in the vacuum chamber further comprises a portion of the fluid.

6. The method of claim 5 , wherein the fluid comprises a flowing gas.

7. The method of claim 1 , wherein
the first light beam comprises an axis, and the intensity of the first light beam is greatest at the axis of the first light beam;
the second light beam comprises an axis, and the intensity of the second beam is greatest at the axis of the second beam;
the first emission direction is determined by a location of the first target relative to the axis of the first light beam, and
the second emission direction is determined by a location of the second target relative to the axis of the second light beam.

8. The method of claim 7 , wherein
the axis of the first light beam and the axis of the second light beam are along the same direction,
the first target is at a location on a first side of the axis of the first light beam, and
the second target is at a location on a second side of the axis of the first light beam.

9. The method of claim 7 , wherein
the axis of the first light beam and the axis of the second light beam are along different directions, and
the first target and the second target are at substantially the same location in the vacuum chamber at different times.

10. The method of claim 7 , wherein the first and second targets are substantially spherical.

11. A method of reducing the effect of plasma on an object in a vacuum chamber of an extreme ultraviolet (EUV) light source, the method comprising:
providing a stream of targets to the vacuum chamber, the stream of targets comprising a plurality of targets, the plurality of targets comprising an initial target and at least one other target;
modifying, in the vacuum chamber, the initial target to form a modified target, the initial target comprising target material in an initial geometric distribution and the modified target comprising target material in a different, modified geometric distribution; and
directing a light beam toward the modified target, the light beam having an energy sufficient to convert at least some of the target material in the modified target to plasma that emits EUV light, the plasma being associated with a directionally dependent flux of particles and radiation, the directionally dependent flux having an angular distribution relative to the modified target, the angular distribution being dependent on a position of the modified target such that positioning the modified target in the vacuum chamber reduces the effect of the plasma on the object, wherein the object comprises one or more other targets in the stream of targets.

12. The method of claim 11 , wherein the modified geometric distribution has a first extent in a first direction and a second extent in a second direction, the second extent being larger than the first extent, and further comprising positioning the modified target by orienting the second extent at an angle relative to the object.

13. The method of claim 12 , wherein the at least one other target in the stream comprises a second initial target; and the method further comprises providing the second initial target to an interior of the vacuum chamber, the initial target and the second initial target traveling along a trajectory.

14. The method of claim 13 , wherein the object is the second initial target.

15. The method of claim 14 , wherein the second

Assignees

• Asml Netherlands Bv

Inventors

• Rafac Robert Jay
• Stewart John Tom
• LaForge Andrew David

Classifications

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/0086

  Optical arrangements for conveying the laser beam to the plasma generation location · CPC title

• H05G2/003 Primary

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/0027

  Arrangements for controlling the supply; Arrangements for measurements · CPC title

• H05G2/0088 Primary

  for preconditioning the plasma generating material · CPC title