Target expansion rate control in an extreme ultraviolet light source

Patent metadata

Field	Value
Publication number	US-11096266-B2
Application number	US-202016859042-A
Country	US
Kind code	B2
Filing date	Apr 27, 2020
Priority date	Aug 12, 2015
Publication date	Aug 17, 2021
Grant date	Aug 17, 2021

Abstract

A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

First claim

What is claimed is:

1. An apparatus for an extreme ultraviolet (EUV) light source, the apparatus comprising:
an optical arrangement configured to interact a first beam of radiation with a target material within a chamber to form a modified target;
a first measurement system comprising a sensor configured to receive radiation reflected from the target material when the target material is interacted with the first beam of radiation;
a second measurement system comprising a plurality of measurement sub-systems, each sub-system configured to measure a spatial aspect of the modified target formed from the interaction between the first beam of radiation and the target material; and
a control system in communication with the first measurement system and the second measurement system, the control system configured to analyze outputs from the first and second measurement systems, and to send information to the optical arrangement based on the analysis.

2. The apparatus of claim 1 , wherein the control system being configured to send information to the optical arrangement based on the analysis causes the optical arrangement to adjust one or more properties of the first beam of radiation.

3. The apparatus of claim 1 , wherein the control system being configured to send information to the optical arrangement based on the analysis comprises maintaining an energy of the first beam of radiation to within an acceptable range of energies.

4. The apparatus of claim 1 , wherein the control system being configured to analyze the outputs from the first and second measurement systems comprises determining whether a feature of the first beam of radiation should be adjusted based on the analysis.

5. The apparatus of claim 1 , wherein the optical arrangement being configured to interact the first beam of radiation with the target material to thereby form the modified target comprises modifying a geometric distribution of the target material.

6. The apparatus of claim 1 , wherein each measurement sub-system is configured to measure the spatial aspect of the modified target by measuring one or more of a size, a position, and an orientation of the modified target.

7. The apparatus of claim 6 , wherein each measurement sub-system includes a backlighting illuminator and a camera.

8. The apparatus of claim 7 , wherein the camera is a charged-coupled device camera.

9. The apparatus of claim 6 , wherein each measurement sub-system employs a shadowgraph technique.

10. The apparatus of claim 1 , wherein the optical arrangement is further configured to interact a second beam of radiation with the modified target to convert at least part of the modified target to plasma that emits EUV light.

11. The apparatus of claim 1 , wherein the optical arrangement comprises an optical source configured to produce the first beam of radiation and the second beam of radiation, and an optical steering system configured to steer the first beam of radiation toward an initial target location and to steer the second beam of radiation toward a target location.

12. The apparatus of claim 11 , wherein the optical steering system comprises a focusing apparatus configured to focus the first beam of radiation at or near the initial target location and to focus the second beam of radiation at or near the target location.

13. A method comprising:
interacting a first beam of radiation with a target material within a chamber to form a modified target;
sensing radiation reflected from the target material when the target material is interacted with the first beam of radiation;
measuring a spatial aspect of the modified target with a first measurement sub-system and measuring a spatial aspect of the modified target with a second measurement sub-system;
analyzing the sensed radiation and outputs from the first and second measurement sub-systems; and
controlling the first beam of radiation based on the analysis.

14. The method of claim 13 , further comprising measuring an angle of the modified target relative to a direction based on the analysis of the outputs from the first and second measurement sub-systems.

15. The method of claim 13 , further comprising measuring a size of the modified target based on the analysis of the outputs from the first and second measurement sub-systems.

16. The method of claim 13 , wherein interacting the first beam of radiation with the target material to thereby form the modified target comprises modifying a geometric distribution of the target material to form the modified target.

17. The method of claim 16 , wherein modifying the geometric distribution of the target material to form the modified target comprises forming a disk shaped volume that is expanded at least along a long axis.

18. The method of claim 13 , further comprising interacting a second beam of radiation with the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light.

19. The method of claim 13 , wherein measuring the spatial aspect of the modified target comprises measuring one or more of a size, a position, and an orientation of the modified target.

20. The method of claim 13 , wherein controlling the first beam of radiation based on the analysis comprises controlling one or more of an energy of the first beam of radiation and an amount of radiant exposure delivered to the target material from the first beam of radiation.

Assignees

• Asml Netherlands Bv

Inventors

• Riggs Daniel Jason
• Rafac Robert Jay

Classifications

• H05G2/0027

  Arrangements for controlling the supply; Arrangements for measurements · CPC title

• H05G2/0088 Primary

  for preconditioning the plasma generating material · CPC title

• H05G2/008 Primary

  involving an energy-carrying beam in the process of plasma generation · CPC title