Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
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Kim Hea-Jung patents
Kim Hea-Jung is listed as an inventor on 18 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Kim Hea-Jung |
| Total patents | 18 |
| First publication | Jul 2, 2015 |
| Latest publication | Jul 9, 2019 |
Notable patents
Publications ranked by popularity score, then publication date.
Method of producing layer structure, layer structure, and method of forming patterns
US-10312074-B2 · Jun 4, 2019 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-10018914-B2 · Jul 10, 2018 · US
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
US-9683114-B2 · Jun 20, 2017 · US
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
US-9671688-B2 · Jun 6, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-9568825-B2 · Feb 14, 2017 · US
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
US-9556094-B2 · Jan 31, 2017 · US
Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
US-9513546-B2 · Dec 6, 2016 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-9348229-B2 · May 24, 2016 · US
Recent patents
Latest publications not already listed above.
Method of producing layer structure, layer structure, and method of forming patterns
US-2016126088-A1 · May 5, 2016 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-2016017174-A1 · Jan 21, 2016 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-2015332931-A1 · Nov 19, 2015 · US
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
US-2015301446-A1 · Oct 22, 2015 · US
Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
US-2015301448-A1 · Oct 22, 2015 · US
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
US-2015274622-A1 · Oct 1, 2015 · US
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
US-2015268558-A1 · Sep 24, 2015 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-2015187589-A1 · Jul 2, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Cheil Ind Inc | 11 |
| Samsung Sdi Co Ltd | 10 |
| Choi Yoo-Jeong | 1 |
| Kim Yun-Jun | 1 |
| Kim Go-Un | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/094 | 16 |
| G03F7/40 | 14 |
| G03F7/11 | 13 |
| G03F7/0752 | 10 |
| G03F7/091 | 10 |