Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition

Patent metadata

Field	Value
Publication number	US-9513546-B2
Application number	US-201314441294-A
Country	US
Kind code	B2
Filing date	Mar 19, 2013
Priority date	Dec 26, 2012
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.

First claim

The invention claimed is:

1. A cross-linkable monomer for a hardmask composition, the monomer being represented by the following Chemical Formula 1:

wherein, in Chemical Formula 1,
A 2 to A 3 are each independently a substituted or unsubstituted aliphatic cyclic group or aromatic cyclic group, and
A 1 is a substituted or unsubstituted aliphatic cyclic group or aromatic cyclic group selected from the following Group 1:
[Group 1]

wherein, in Group 1,
Z 1 and Z 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, C═O, NR a , oxygen (O), sulfur (S), or a combination thereof, wherein R a is hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof, and
Z 3 to Z 17 are independently C═O, NR a , oxygen (O), sulfur (S), CR b R c , or a combination thereof, wherein R a to R c are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, a halogen-containing group, or a combination thereof,
X 1 and X 2 are each independently C═O, NR a , oxygen (O), sulfur (S), CR b R c , or a combination thereof, wherein R a to R c are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a hydroxy group, a halogen atom, a halogen-containing group, or a combination thereof, at least one of X 1 or X 2 being C═O,
L 1 and L 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, or a combination thereof,
Y 1 and Y 2 are each independently a substituted or unsubstituted C2 to C20 alkenyl group,
n1 and n2 are integers of 0≦n1≦10 and 0≦n2≦10, and
n1 and n2 are not simultaneously 0.

2. The monomer of claim 1 , wherein A 2 to A 3 are each independently a substituted or unsubstituted cyclic group selected from the following Group 1:
[Group 1]

wherein, in Group 1,
Z 1 and Z 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, C═O, NR a , oxygen (O), sulfur (S), or a combination thereof, wherein R a is hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof, and
Z 3 to Z 17 are independently C═O, NR a , oxygen (O), sulfur (S), CR b R c , or a combination thereof, wherein R a to R c are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, a halogen-containing group, or a combination thereof.

3. The monomer of claim 1 , wherein at least one of A 1 to A 3 is a polycyclic aromatic group.

4. The monomer of claim 1 , wherein the monomer is represented by one of the following Chemical Formulae 2 to 7:

wherein in Chemical Formulae 2 to 7, n is 1 to 4.

5. The monomer of claim 1 , wherein the monomer has a molecular weight of about 200 to about 5,000.

6. A hardmask composition, comprising
a cross-linkable monomer represented by the following Chemical Formula 1, and
a solvent:

wherein, in Chemical Formula 1,
A 1 to A 3 are each independently a substituted or unsubstituted aliphatic cyclic group or aromatic cyclic group,
X 1 and X 2 are each independently C═O, NR a , oxygen (O), sulfur (S), CR b R c , or a combination thereof, wherein R a to R c are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a hydroxy group, a halogen atom, a halogen-containing group, or a combination thereof,
L 1 and L 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, or a combination thereof,
Y 1 and Y 2 are each independently a substituted or unsubstituted C2 to C20 alkenyl group,
n1 and n2 are integers of 0≦n1≦10 and 0≦n2≦10, and
n1 and n2 are not simultaneously 0.

7. The hardmask composition of claim 6 , wherein the A 1 to A 3 are each independently a substituted or unsubstituted cyclic group selected from the following Group 1:

wherein, in Group 1,
Z 1 and Z 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, C═O, NR a , oxygen (O), sulfur (S), or a combination thereof, wherein R a is hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof,
Z 3 to Z 17 are independently C═O, NR a , oxygen (O), sulfur (S), CR b R c , or a combination thereof, wherein R a to R c are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, a halogen-containing group, or a combination thereof.

8. The hardmask composition of claim 6 , wherein at least one of A 1 to A 3 is a polycyclic aromatic group.

9. The hardmask composition of claim 6 , wherein the monomer is represented by one of the following Chemical Formulae 2 to 7:

wherein in Chemical Formulae 2 to 7, n is 1 to 4.

10. The hardmask composition of claim 6 , wherein the monomer has a molecular weight of 200 to 5,000.

11. The hardmask composition of

Assignees

• Cheil Ind Inc
• Cheil Ind Inc

Inventors

• Park You-Jung
• Kim Hea-Jung
• Park Yo-Choul
• Yoon Yong-Woon
• Lee Sung-Jae
• Lee Chul-Ho
• Cho Youn-Jin

Classifications

• G03F7/16

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• C07C49/83

  polycyclic · CPC title

• G03F7/027 Primary

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

• G03F7/36

  Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma · CPC title

• C07C49/796

  polycyclic · CPC title