Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-12578646-B2 · Mar 17, 2026 · US
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Keszler Douglas A patents
Keszler Douglas A is listed as an inventor on 92 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Keszler Douglas A |
| Total patents | 92 |
| First publication | Feb 26, 2015 |
| Latest publication | Mar 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Process environment for inorganic resist patterning
US-2026072354-A1 · Mar 12, 2026 · US
Radiation based patterning methods
US-12554195-B2 · Feb 17, 2026 · US
Process environment for inorganic resist patterning
US-12498641-B2 · Dec 16, 2025 · US
Organometallic solution based high resolution patterning compositions and corresponding methods
US-12487522-B2 · Dec 2, 2025 · US
Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-12443105-B2 · Oct 14, 2025 · US
Solution deposition of metal salts to form metal oxides
US-2025313487-A1 · Oct 9, 2025 · US
Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-2025224680-A1 · Jul 10, 2025 · US
Aqueous solution precursors for making oxide thin films, and composition and method for making conductive oxide thin films therefrom
US-2025171904-A1 · May 29, 2025 · US
Process environment for inorganic resist patterning
US-2025164887-A1 · May 22, 2025 · US
Recent patents
Latest publications not already listed above.
Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-12276913-B2 · Apr 15, 2025 · US
Organometallic solution based high resolution patterning compositions
US-2025093773-A1 · Mar 20, 2025 · US
Organometallic solution based high resolution patterning compositions
US-12235578-B2 · Feb 25, 2025 · US
Organometallic solution based high resolution patterning compositions
US-12189286-B2 · Jan 7, 2025 · US
Radiation based patterning methods
US-2025004365-A1 · Jan 2, 2025 · US
Organometallic solution based high resolution patterning compositions and corresponding methods
US-2024337926-A1 · Oct 10, 2024 · US
Organometallic solution based high resolution patterning compositions and corresponding methods
US-2024280897-A1 · Aug 22, 2024 · US
Process environment for inorganic resist patterning
US-2024272557-A1 · Aug 15, 2024 · US
Organometallic solution based high resolution patterning compositions
US-11988958-B2 · May 21, 2024 · US
Organometallic solution based high resolution patterning compositions
US-11988960-B2 · May 21, 2024 · US
Organometallic solution based high resolution patterning compositions and corresponding methods
US-11988959-B2 · May 21, 2024 · US
Radiation based patterning methods
US-11988961-B2 · May 21, 2024 · US
Organometallic solution based high resolution patterning compositions
US-11966159-B2 · Apr 23, 2024 · US
Process environment for inorganic resist patterning
US-11947262-B2 · Apr 2, 2024 · US
Solution deposition of metal salts to form metal oxides
US-2023416105-A1 · Dec 28, 2023 · US
Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-11809081-B2 · Nov 7, 2023 · US
Radiation based patterning methods
US-2023305390-A1 · Sep 28, 2023 · US
Organotin oxide hydroxide patterning compositions, precursors, and patterning
US-11754924-B2 · Sep 12, 2023 · US
Radiation based patterning methods
US-11693312-B2 · Jul 4, 2023 · US
Tin-based photoresist composition and method of making
US-2023112618-A1 · Apr 13, 2023 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Inpria Corp | 67 |
| Univ Oregon State | 20 |
| Hewlett Packard Development Co | 7 |
| The State Of Oregon State Board Of Higher Education On Behalf Of Oregon State Univ | 5 |
| Univ Oregon | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0042 | 67 |
| G03F7/0043 | 60 |
| G03F7/325 | 46 |
| G03F7/004 | 44 |
| G03F7/30 | 34 |