Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device
US-12346026-B2 · Jul 1, 2025 · US
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Kamimura Sou patents
Kamimura Sou is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Kamimura Sou |
| Total patents | 22 |
| First publication | Apr 7, 2015 |
| Latest publication | Jul 1, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device
US-2024053679-A1 · Feb 15, 2024 · US
Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device
US-2022252985-A1 · Aug 11, 2022 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
US-10248019-B2 · Apr 2, 2019 · US
Pattern forming method and resist composition
US-10126653-B2 · Nov 13, 2018 · US
Method of forming pattern and developer for use in the method
US-9897922-B2 · Feb 20, 2018 · US
Pattern forming method and actinic-ray- or radiation-sensitive resin composition
US-9760003-B2 · Sep 12, 2017 · US
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
US-9709892-B2 · Jul 18, 2017 · US
Method of forming pattern
US-2017102618-A1 · Apr 13, 2017 · US
Pattern forming method and resist composition
US-9551935-B2 · Jan 24, 2017 · US
Recent patents
Latest publications not already listed above.
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
US-9513547-B2 · Dec 6, 2016 · US
Method of forming pattern and developer for use in the method
US-2016349620-A1 · Dec 1, 2016 · US
Method of forming pattern and developer for use in the method
US-9482958-B2 · Nov 1, 2016 · US
Active lightray-sensitive or radiation-sensitive resin composition and pattern forming method
US-2016223905-A1 · Aug 4, 2016 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development used therefor and method of manufacturing the same, method of manufacturing electronic device, and electronic device
US-2016004156-A1 · Jan 7, 2016 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
US-9223219-B2 · Dec 29, 2015 · US
Method of forming pattern and developer for use in the method
US-2015293454-A1 · Oct 15, 2015 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
US-9128376-B2 · Sep 8, 2015 · US
Pattern forming method, chemical amplification resist composition and resist film
US-9116437-B2 · Aug 25, 2015 · US
Method of forming pattern and developer for use in the method
US-9097973-B2 · Aug 4, 2015 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
US-2015147699-A1 · May 28, 2015 · US
Pattern forming method, chemical amplification resist composition and resist film
US-8999621-B2 · Apr 7, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Fujifilm Corp | 22 |
| Kamimura Sou | 8 |
| Enomoto Yuichiro | 7 |
| Tarutani Shinji | 7 |
| Iwato Kaoru | 7 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0397 | 19 |
| G03F7/325 | 19 |
| G03F7/2041 | 18 |
| G03F7/0382 | 14 |
| G03F7/0046 | 13 |