Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development used therefor and method of manufacturing the same, method of manufacturing electronic device, and electronic device

Patent metadata

Field	Value
Publication number	US-2016004156-A1
Application number	US-201514853119-A
Country	US
Kind code	A1
Filing date	Sep 14, 2015
Priority date	Mar 15, 2013
Publication date	Jan 7, 2016
Grant date	—

Abstract

There is provided a pattern forming method including: (1) filtering, by using a filter, a resin solution containing (A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (C1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition containing the resin (A) obtained from the filtrating (1) and a solvent (C2) different from the solvent (C1); (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition by using a filter; (4) forming a film by using a filtrate obtained by the filtering (3); (5) exposing the film; and (6) performing development using a developer containing an organic solvent to form a negative pattern, wherein an absolute value of the difference between solubility parameter (SP C1 ) of the solvent (C1) and solubility parameter (SP DEV ) of the developer (C1), |SP C1 −SP DEV |, is 1.00 (cal/cm 3 ) 1/2 or less.

First claim

What is claimed is:

1 . A pattern forming method comprising:
(1) filtering, by using a filter, a resin solution containing (A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (C1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition which contains the resin (A) obtained from the filtrating (1) and a solvent (C2) that is different from the solvent (C1); (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition by using a filter; (4) forming a film by using a filtrate obtained by the filtering (3); (5) exposing the film; and (6) performing development using a developer containing an organic solvent to form a negative pattern, wherein an absolute value of the difference between solubility parameter (SP c1 ) of the solvent (C1) and solubility parameter (SP DEV ) of the developer (C1), |SP C1 −SP DEV |, is 1.00 (cal/cm 3 ) 1/2 or less.

2 . The pattern forming method according to claim 1 ,
wherein the absolute value |SP C1 −SP DEV | is 0.40 (cal/cm 3 ) 1/2 or less.

3 . The pattern forming method according to claim 1 ,
wherein the solvent (C1) and the developer are the same.

4 . The pattern forming method according to claim 1 ,
wherein, when the filtering (1) is performed once, the absolute value of the difference between the solubility parameter (SP C1 ) of the solvent (C1) and the solubility parameter (SP C2 ) of the solvent (C2), |SP C1 −SP C2 |, is 0.40 (cal/cm 3 ) 1/2 or more; and when the filtering (1) is performed twice or more, in at least one of two or more filtering (1), the absolute value of the difference between the solubility parameter (SP C1 ) of the solvent (C1) and the solubility parameter (SP C2 ) of the solvent (C2), |SP C1 −SP C2 |, is 0.40 (cal/cm 3 ) 1/2 or more.

5 . The pattern forming method according to according to claim 1 ,
wherein the solvent (C1) is one or more solvents selected from the group consisting of butyl acetate, methyl amyl ketone, ethyl 3-ethoxy propionate, ethyl acetate, propyl acetate, isopropyl acetate, isobutyl acetate, pentyl acetate, isopentyl acetate, and methyl 3-methoxy propionate.

6 . The pattern forming method according to claim 1 ,
wherein the resin (A) includes a repeating unit represented by Formula (AI):

wherein in Formula (AI),
Xa 1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom,
T represents a single bond or a divalent linking group,
each of Rx 1 to Rx 3 independently represents an alkyl group or a cycloalkyl group, and
two of Rx 1 to Rx 3 may combine with each other to form a ring structure.

7 . The pattern forming method according to claim 1 ,
wherein the resin (A) is a resin including a repeating unit having a lactone structure or a sultone structure.

8 . The pattern forming method according to claim 1 ,
wherein the resin (A) is a resin including a repeating unit having a cyclic carbonate ester structure.

9 . The pattern forming method according to claim 1 ,
wherein the filter in the filtering (1) is a filter containing a polyamide-based resin filter or a polyethylene-based resin filter.

10 . The pattern forming method according to claim 1 ,
wherein a pore size of the filter in the filtering (1) is 0.1 μm or less.

11 . An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
(A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent; and (C2) a solvent, wherein the resin (A) is obtained from a filtrate which is obtained by filtering, by using a filter, a resin solution containing the resin (A) and a solvent (C1) that is different from the solvent (C2), and the solvent (C1) is one or more solvents selected from the group consisting of butyl acetate, methyl amyl ketone, ethyl 3-ethoxy propionate, ethyl acetate, propyl acetate, isopropyl acetate, isobutyl acetate, pentyl acetate, isopentyl acetate, and methyl 3-methoxy propionate.

12 . The actinic ray-sensitive or radiation-sensitive resin composition according to claim 11 ,
wherein the filter is a filter containing a polyamide-based resin filter or a polyethylene-based resin filter.

13 . The actinic ray-sensitive or radiation-sensitive resin composition according to claim 11 ,
wherein a pore size of the filter is 0.1 μm or less.

14 . The actinic ray-sensitive or radiation-sensitive resin composition according to claim 11 ,
wherein the resin (A) includes a repeating unit represented by Formula (AI):

wherein in Formula (AI),
Xa 1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom,
T represents a single bond or a divalent linking group,
each of Rx 1 to Rx 3 independently represcnts an alkyl group or a cycloalkyl group, and
two of Rx 1 to Rx 3 may combine with each other to form a ring structure.

15 . The actinic ray-sensitive or radiation-sensitive resin composition according to claim 11 ,
wherein the resin (A) is a resin including a repeating unit having a lactone structure or a sultone structure.

16 . The actinic ray-sensitive or radiation-sensitive resin composition according to claim 11 ,
wherein the resin (A) is a resin including a repeating unit having a cyclic carbonate ester structure.

17 . A method of preparing an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development, comprising:
(1) filtering, by using a filter, a resin solution containing (A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (C1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development, containing the resin (A) obtained from a filtrate in the filtering (1) and a solvent (C2) that is different from the solvent (C1); and (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development by using a filter, and the solvent (C1) is one or more solvents selected from the group consisting of butyl acetate, methyl amyl ketone, ethyl 3-ethoxy propionate, ethyl acetate, propyl acetate, isopropyl acetate, isobutyl acetate, pentyl acetate, isopentyl acetate, and methyl 3-methoxy propionate.

18 . The method of preparing an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development according to claim 17 ,
wherein the filter is a filter containing a polyamide-based resin filter or a polyethylene-based resin filter.

19 . The method of preparing an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development according to claim 17 ,
wherein a pore size of the filter is 0.1 μm or less.

20 . The method of preparing an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development according to claim 17 ,
wherein the resin (A) includes a repeating unit represented by Formula (AI):

wherein in Formula (AI),

Assignees

• Fujifilm Corp

Inventors

• Sugiyama Shinichi
• Kamimura Sou
• Goto Akiyoshi

Classifications

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• G03F7/0048 Primary

  characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title