Method of forming pattern and developer for use in the method

Patent metadata

Field	Value
Publication number	US-9897922-B2
Application number	US-201615235675-A
Country	US
Kind code	B2
Filing date	Aug 12, 2016
Priority date	Jun 30, 2010
Publication date	Feb 20, 2018
Grant date	Feb 20, 2018

Abstract

Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

First claim

What is claimed is:

1. A method for manufacturing an electronic device, comprising a pattern forming method comprising:
(a) applying a chemically amplified resist composition onto a substrate to form a film;
(b) exposing the film selectively to actinic rays or radiation through a mask; and
(c) developing the exposed film with a developer containing an organic solvent to form a pattern,
wherein the chemically amplified resist composition contains a resist that when acted on by an acid, decreases its solubility in the developer containing an organic solvent,
wherein the developer contains an alcohol compound (X) at a content of not more than 500 ppm based on the total mass of the developer, and
wherein the developer contains substantially no water.

2. The method for manufacturing an electronic device according to claim 1 ,
wherein the developer contains at least one organic solvent selected from among ester compounds (A1) and ketone compounds (A2), and
the developer contains an alcohol compound (X1) with a structure resulting from hydrolysis of any of the ester compounds (A1) and an alcohol compound (X2) with a structure resulting from reduction of any of the ketone compounds (A2) at a content of the sum thereof of not more than 500 ppm based on the total mass of the developer.

3. The method for manufacturing an electronic device according to claim 2 , wherein at least one of the alcohol compounds (X1) and the alcohol compounds (X2) is a monohydric alcohol having 7 or less carbon atoms.

4. The method for manufacturing an electronic device according to claim 2 ,
wherein
the ester compound (A1) is at least one of n-butyl acetate, cyclohexyl acetate and ethyl 3-ethoxypropionate, and
the ketone compound (A2) is at least one of 2-heptanone and cyclohexanone.

5. The method for manufacturing an electronic device according to claim 2 , wherein the alcohol compound (X1) and the alcohol compound (X2) are at least one of 1-butanol, 2-heptanol, ethanol and cyclohexanol.

6. The method for manufacturing an electronic device according to claim 2 , wherein the ester compound (A1) is n-butyl acetate.

7. The method for manufacturing an electronic device according to claim 2 , wherein the ketone compound (A2) is 2-heptanone.

8. The method for manufacturing an electronic device according to claim 2 , wherein the ester compound (A1) is at least one of methyl acetate, n-butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, ethyl 3-ethoxypropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, methyl formate, ethyl formate, butyl formate, propyl formate and cyclohexyl acetate.

9. The method for manufacturing an electronic device according to claim 2 , wherein the ketone compound (A2) is at least one of 1-octanone, 2-octanone, 1-nonanone, 2-nonanone, acetone, 2-heptanone, 3-heptanone, 4-heptanone, 1-hexanone, 2-hexanone, diisobutyl ketone, methyl amyl ketone, cyclohexanone, methylcyclohexanone, phenylacetone, methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, acetonylacetone, ionone, acetophenone, methyl naphthyl ketone, isophorone and propylene carbonate.

10. The method for manufacturing an electronic device according to claim 1 , wherein the organic solvent is purified by distillation.

11. The method for manufacturing an electronic device according to claim 1 , wherein the developer contains substantially only one type of the organic solvent.

12. The method for manufacturing an electronic device according to claim 11 , wherein the substantially only one type of organic solvent is n-butyl acetate.

Assignees

• Fujifilm Corp

Inventors

• Enomoto Yuichiro
• Tarutani Shinji
• Kamimura Sou
• Iwato Kaoru
• Kato Keita
• Fujii Kana

Classifications

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/422

  using liquids only (G03F7/421 takes precedence) · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title