Seam free titanium nitride gapfill
US-2024404830-A1 · Dec 5, 2024 · US
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Jackson Michael S patents
Jackson Michael S is listed as an inventor on 18 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Jackson Michael S |
| Total patents | 18 |
| First publication | Dec 20, 2018 |
| Latest publication | Dec 5, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Mitigation of first wafer effect
US-2024379343-A1 · Nov 14, 2024 · US
Hydrogen plasma treatment for forming logic devices
US-2024304495-A1 · Sep 12, 2024 · US
Wafer treatment for achieving defect-free self-assembled monolayers
US-11735420-B2 · Aug 22, 2023 · US
Methods for enhancing selectivity in SAM-based selective deposition
US-11515155-B2 · Nov 29, 2022 · US
Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based Selective Deposition
US-2021283650-A1 · Sep 16, 2021 · US
Methods For Enhancing Selectivity In Sam-Based Selective Deposition
US-2021217615-A1 · Jul 15, 2021 · US
Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition
US-11033930-B2 · Jun 15, 2021 · US
Methods for enhancing selectivity in SAM-based selective deposition
US-10950433-B2 · Mar 16, 2021 · US
Wafer treatment for achieving defect-free self-assembled monolayers
US-2020402792-A1 · Dec 24, 2020 · US
Recent patents
Latest publications not already listed above.
Wafer treatment for achieving defect-free self-assembled monolayers
US-10770292-B2 · Sep 8, 2020 · US
Selective deposition defects removal by chemical etch
US-10643840-B2 · May 5, 2020 · US
Substrate support for plasma etch operations
US-10593521-B2 · Mar 17, 2020 · US
Methods of treating a substrate to form a layer thereon for application in selective deposition processes
US-2019326114-A1 · Oct 24, 2019 · US
Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based Selective Deposition
US-2019210061-A1 · Jul 11, 2019 · US
Methods for Enhancing Selectivity in SAM-Based Selective Deposition
US-2019157079-A1 · May 23, 2019 · US
Selective Deposition Defects Removal By Chemical Etch
US-2019080904-A1 · Mar 14, 2019 · US
Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers
US-2018366317-A1 · Dec 20, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 18 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P95/00 | 14 |
| H10P14/6339 | 11 |
| H10P14/61 | 10 |
| H01L21/0228 | 9 |
| H01L21/3105 | 9 |