Methods And Systems For Model-less, Scatterometry Based Measurements Of Semiconductor Structures
US-2024085321-A1 · Mar 14, 2024 · US
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Hench John patents
Hench John is listed as an inventor on 19 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hench John |
| Total patents | 19 |
| First publication | Oct 22, 2015 |
| Latest publication | Mar 14, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Computationally efficient x-ray based overlay measurement
US-11428650-B2 · Aug 30, 2022 · US
Visualization of three-dimensional semiconductor structures
US-11099137-B2 · Aug 24, 2021 · US
Methods and systems for characterization of an x-ray beam with high spatial resolution
US-11073487-B2 · Jul 27, 2021 · US
On-device metrology using target decomposition
US-10983227-B2 · Apr 20, 2021 · US
Visualization of Three-Dimensional Semiconductor Structures
US-2020393386-A1 · Dec 17, 2020 · US
Visualization of three-dimensional semiconductor structures
US-10794839-B2 · Oct 6, 2020 · US
Visualization of Three-Dimensional Semiconductor Structures
US-2020271595-A1 · Aug 27, 2020 · US
Phase revealing optical and X-ray semiconductor metrology
US-10677586-B2 · Jun 9, 2020 · US
Computationally Efficient X-ray Based Overlay Measurement
US-2020116655-A1 · Apr 16, 2020 · US
Recent patents
Latest publications not already listed above.
Phase Revealing Optical and X-Ray Semiconductor Metrology
US-2020080836-A1 · Mar 12, 2020 · US
Computationally efficient X-ray based overlay measurement
US-10545104-B2 · Jan 28, 2020 · US
Calibration of a small angle X-ray scatterometry based metrology system
US-10481111-B2 · Nov 19, 2019 · US
On-Device Metrology Using Target Decomposition
US-2019049602-A1 · Feb 14, 2019 · US
Methods And Systems For Characterization Of An X-Ray Beam With High Spatial Resolution
US-2018328868-A1 · Nov 15, 2018 · US
Calibration Of A Small Angle X-Ray Scatterometry Based Metrology System
US-2018113084-A1 · Apr 26, 2018 · US
Scatterometry-based imaging and critical dimension metrology
US-9494535-B2 · Nov 15, 2016 · US
Computationally Efficient X-ray Based Overlay Measurement
US-2016320319-A1 · Nov 3, 2016 · US
Scatterometry-Based Imaging and Critical Dimension Metrology
US-2015300965-A1 · Oct 22, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 14 |
| Kla Corp | 6 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G01N23/201 | 15 |
| H10P74/203 | 8 |
| G01N21/9501 | 8 |
| G01N23/207 | 8 |
| H10P74/27 | 6 |