Workpiece with a hollow structure, method for at least partially forming a hollow structure, mirror, and lithography system
US-2026063832-A1 · Mar 5, 2026 · US
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Eva Eric patents
Eva Eric is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Eva Eric |
| Total patents | 25 |
| First publication | May 19, 2015 |
| Latest publication | Mar 5, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Optical element having a polishing layer, lithography apparatus comprising the optical element, and method for producing the optical element
US-2025362582-A1 · Nov 27, 2025 · US
Mirror, in particular for a microlithographic projection exposure apparatus, and method of processing a mirror
US-2025231399-A1 · Jul 17, 2025 · US
Method for producing a main body of an optical element for semiconductor lithography, main body, optical element and projection exposure apparatus
US-2025135716-A1 · May 1, 2025 · US
Method for producing a mirror of a microlithographic projection exposure apparatus
US-12117731-B2 · Oct 15, 2024 · US
Optical element with cooling channels, and optical arrangement
US-2024219849-A1 · Jul 4, 2024 · US
Method for producing a mirror of a microlithographic projection exposure apparatus
US-2024192605-A1 · Jun 13, 2024 · US
Substrate for a reflective optical element
US-11987521-B2 · May 21, 2024 · US
Method for producing a mirror of a lithography system
US-2024027730-A1 · Jan 25, 2024 · US
Method for producing a mirror of a microlithographic projection exposure apparatus
US-2024019613-A1 · Jan 18, 2024 · US
Recent patents
Latest publications not already listed above.
Optical element and lithography system
US-11874525-B2 · Jan 16, 2024 · US
Method for producing a multi-part mirror of a projection illumination system for microlithography
US-2023375939-A1 · Nov 23, 2023 · US
Optical element and lithography system
US-2022299731-A1 · Sep 22, 2022 · US
Component for a mirror array for EUV lithography
US-11126087-B2 · Sep 21, 2021 · US
Method for repairing reflective optical elements for EUV lithography
US-11099484-B2 · Aug 24, 2021 · US
Substrate for a reflective optical element
US-2021116616-A1 · Apr 22, 2021 · US
Optical manipulator, projection lens and projection exposure apparatus
US-10976667-B2 · Apr 13, 2021 · US
Reflective optical element for EUV lithography
US-10649340-B2 · May 12, 2020 · US
Method for repairing reflective otpical elements for euv lithography
US-2019302628-A1 · Oct 3, 2019 · US
Method for loading a blank composed of fused silica with hydrogen, lens element and projection lens
US-10427965-B2 · Oct 1, 2019 · US
Component for a mirror array for euv lithography
US-2019212654-A1 · Jul 11, 2019 · US
Reflective optical element for euv lithography
US-2019171108-A1 · Jun 6, 2019 · US
Optical manipulator, projection lens and projection exposure apparatus
US-2017108780-A1 · Apr 20, 2017 · US
Method for loading a blank composed of fused silica with hydrogen, lens element and projection lens
US-2016145137-A1 · May 26, 2016 · US
Method and apparatus for determining the absorption in a blank
US-9036152-B2 · May 19, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 25 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70316 | 17 |
| G02B5/0891 | 16 |
| G03F7/70958 | 12 |
| G03F7/70891 | 9 |
| C03C3/06 | 8 |